Photoresist monomer, photoresist and method for the preparation thereof, color filter

Patent metadata

Field	Value
Publication number	US-9365505-B2
Application number	US-201314381746-A
Country	US
Kind code	B2
Filing date	Dec 13, 2013
Priority date	Jul 15, 2013
Publication date	Jun 14, 2016
Grant date	Jun 14, 2016

Abstract

A photoresist monomer, a photoresist and a method for the preparation thereof, a color filter. The photoresist monomer has a structure represented by Formula I,

wherein, R 1 is hydrogen or methyl; R 2 is hydrogen, methyl, ethyl, or propyl; R 3 is hydrogen or C 1-6 alkyl; and n is from 1 to 4. The resulting photoresist exhibits a compact and smooth surface and a gentle angle of slope.

First claim

The invention claimed is:

1. A photoresist monomer having a structure represented by Formula I,

wherein, R 1 is hydrogen or methyl; R 2 is hydrogen, methyl, ethyl, or propyl; R 3 is hydrogen or C 1-6 alkyl; and n is from 1 to 4,
wherein, in Formula I, m 1 , m 2 , and m 3 are in the range of 50-400.

2. A photoresist comprising the photoresist monomer of claim 1 , or a mixture of photoresist monomers.

3. The photoresist according to claim 2 , wherein, said photoresist further comprises an alkaline soluble resin, a pigment dispersion, a photoinitiator, a solvent, and an adjuvant; said photoresist comprising, in part by weight,
photoresist monomer or a mixture of photoresist monomers: 11.2-21.2 parts;
alkaline soluble resin: 7.4-19.8 parts;
pigment dispersion: 35.2-57.6 parts;
photoinitiator: 1.8-11.9 parts;
solvent: 11.26-28.5 parts; and
adjuvant: 0.07-0.21 part.

4. The photoresist according to claim 3 , wherein, the mixture of the photoresist monomers comprises photoresist monomers A, B, and C, wherein,
the photoresist monomer A has a structure of Formula I in which n is 1, and is in 1 part by weight;
the photoresist monomer B has a structure of Formula I in which n is 2, and is in 2.3-4.3 parts by weight; and
the photoresist monomer C has a structure of Formula I in which n is 3, and is in 5.1-5.7 parts by weight.

5. The photoresist according to claim 3 , wherein, the mixture of the photoresist monomers comprises photoresist monomers A, B, and D, wherein,
the photoresist monomer A has a structure of Formula I in which n is 1, and is in 1 part by weight;
the photoresist monomer B has a structure of Formula I in which n is 2, and is in 2.7-3.5 parts by weight; and
the photoresist monomer D has a structure of Formula I in which n is 4, and is in 3.3-5.5 parts by weight.

6. The photoresist according to claim 3 , wherein, the mixture of the photoresist monomers comprises photoresist monomers B, C, and D, wherein,
the photoresist monomer B has a structure of Formula I in which n is 2, and is in 1 part by weight;
the photoresist monomer C has a structure of Formula I in which n is 3, and is in 2.3-3.1 parts by weight; and
the photoresist monomer D has a structure of Formula I in which n is 4, and is in 4.7-7.5 parts by weight.

7. The photoresist according to claim 2 , wherein, the mixture of the photoresist monomers comprises photoresist monomers A, B, and C, wherein,
the photoresist monomer A has a structure of Formula I in which n is 1, and is in 1 part by weight;
the photoresist monomer B has a structure of Formula I in which n is 2, and is in 2.3-4.3 parts by weight; and
the photoresist monomer C has a structure of Formula I in which n is 3, and is in 5.1-5.7 parts by weight.

8. The photoresist according to claim 2 , wherein, the mixture of the photoresist monomers comprises photoresist monomers A, B and D, wherein,
the photoresist monomer A has a structure of Formula I in which n is 1, and is n 1 part by weight;
the photoresist monomer B has a structure of Formula I in which n is 2, is 2.7-3.5 parts by weight; and
the photoresist monomer D has a structure of Formula I in which n is 4, and is an 3.3-5.5 parts by weight.

9. The photoresist according to claim 2 , wherein, the mixture of the photoresist monomers comprises photoresist monomers B, C, and D, wherein,
the photoresist monomer B has a structure of Formula I in which n is 2, and is in 1 part by weight;
the photoresist monomer C has a structure of Formula I in which n is 3, and is in 2.3-3.1 parts by weight; and
the photoresist monomer D has a structure of Formula I in which n is 4, and is in 4.7-7.5 parts by weight.

10. A color filter, comprising:
a substrate;
a black matrix provided on the substrate; and
a color filter lap-jointly provided on the black matrix, said color filter being formed by the photoresist of claim 2 .

11. A method for preparing the photoresist of claim 2 , comprising:
Step Q1: mixing a photoinitiator, a solvent, and an adjuvant with stirring, until the photoinitiator is dissolved;
Step Q2: adding a mixture of an alkaline soluble resin, and a photoresist monomer or a mixture of photoresist monomers to the mixed solution from step Q1, and stirring the mixture to a transparent state;
Step Q3: adding a pigment dispersion to the mixture from step Q2, to produce the photoresist.

12. A method for preparing a photoresist monomer is provided, which comprises:
(1) reacting polyether polyol as shown by Formula II

with R 3 -substituted benzenesulfonyl chloride as shown by Formula III

in a proper solvent, to generate R 3 -substituted benzenesulfonyl chloride-modified polyether polyol as shown by Formula IV;

(2) reacting R 3 -substituted benzenesulfonyl chloride-modified polyether polyol as shown by Formula IV with R 2 -substituted acryloyl chloride as shown by Formula V

in a proper solvent in the presence of a catalyst, to generate the photoresist monomer having a structure represented by Formula I,

wherein, R 1 is hydrogen or methyl; R 2 is hydrogen, methyl, ethyl, or propyl; R 3 is hydrogen or C 1-6 alkyl; and n is from 1 to 4,
wherein, in Formula I, m 1 , m 2 , and m 3 are in the range of 50-400.

13. The method according to claim 12 , wherein, polyether polyol, R 3 -substituted benzenesulfonyl chloride, and the solvent in step (1) are, in parts by weight:
polyether polyol: 2 parts;
R 3 -substituted benzenesulfonyl chloride: 0.7-0.9 part;
solvent; 100-160 parts.

14. The method according to claim 12 ,
wherein, R 3 -substituted benzenesulfonyl chloride-modified polyether polyol, R 2 -substituted acryloyl chloride, the solvent, and the catalyst in step (2) are, in parts by weight:
R 3 -substituted benzenesulfonyl chloride-modified polyether polyol: 1 part;
R 2 -substituted acryloyl chloride: 2.3-6.1 parts;
solvent: 45-135 parts;
catalyst: 0.0145-0.035 part.

Assignees

• Boe Technology Group Co Ltd
• Boe Technology Group Co Ltd

Inventors

• Wang Xuelan
• Tang Chen

Classifications

• G03F7/0007

  Filters, e.g. additive colour filters; Components for display devices · CPC title

• C07C303/26

  of esters of sulfonic acids · CPC title

• G02B5/201

  in the form of arrays · CPC title

• G03F7/004 Primary

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

• G03F7/027

  Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title