Method and apparatus for diagnosing status of parts in real time in plasma processing equipment

US9541514B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9541514-B2
Application numberUS-201514969614-A
CountryUS
Kind codeB2
Filing dateDec 15, 2015
Priority dateSep 4, 2007
Publication dateJan 10, 2017
Grant dateJan 10, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Apparatus and methods for diagnosing status of a consumable part of a plasma reaction chamber, the consumable part including at least one conductive element embedded therein. The method includes the steps of: coupling the conductive element to a power supply so that a bias potential relative to the ground is applied to the conductive element; exposing the consumable part to plasma erosion until the conductive element draws a current from the plasma upon exposure of the conductive element to the plasma; measuring the current; and evaluating a degree of erosion of the consumable part due to the plasma based on the measured current.

First claim

Opening claim text (preview).

What is claimed is: 1. A consumable part of a plasma reaction chamber, the consumable part comprising: an electrode formed of electrically conductive material and including a surface to be exposed to plasma; conductive elements embedded in the electrically conductive material of the electrode and entirely surrounded by and electrically insulated from the electrically conductive material of the electrode by a dielectric layer; the electrode configured such that the conductive elements can be coupled to a probe circuit which can be coupled to a power supply and ground to apply a bias potential to the conductive elements relative to ground; and the conductive elements are operative to draw a current from the plasma upon exposure of the conductive elements to the plasma and the conductive elements are electrically connected to each other by a conductive wire embedded in and electrically insulated from the electrically conductive material of the electrode. 2. The consumable part of claim 1 , wherein the power supply is a DC power source. 3. The consumable part of claim 1 , wherein the probe circuit includes a resistor and a voltmeter to measure an electrical potential across the resistor. 4. The consumable part of claim 1 , wherein each of the conductive elements has a shape selected from the group consisting of pin, polygonal, circular, and annular. 5. The consumable part of claim 1 , wherein the power supply is operable to supply a bias potential of 10 to 15 volts relative to the ground to the conductive elements. 6. The consumable part of claim 1 , wherein the power supply is connected in series to the probe circuit. 7. The consumable part of claim 3 , wherein the voltmeter is connected to the resistor in parallel. 8. The consumable part of claim 1 , wherein the conductive elements are embedded at a depth corresponding to a diagnostic event. 9. The consumable part of claim 8 , wherein the diagnostic event is an end of a useful lifetime of the consumable part. 10. The consumable part of claim 1 , wherein the conductive elements are annular conductive elements embedded in the consumable part. 11. A consumable part configured as a diagnostic sensor for monitoring the operational condition and structural status of an edge ring for use in a plasma reaction chamber, comprising: an edge ring of dielectric material including a surface to be exposed to plasma when the edge ring is mounted in the plasma reaction chamber; a plurality of probes of electrically conductive material completely surrounded by and embedded in the edge ring and arranged circumferentially at a preset angular interval about a central axis of the edge ring, and a connection wire embedded in the edge ring and electrically connected to each of the plurality of probes. 12. The consumable part of claim 11 , wherein the plurality of probes are coupled to a probe circuit. 13. A method for diagnosing operational conditions of an edge ring mounted in a plasma reaction chamber in real time, comprising: processing a semiconductor substrate in the plasma reaction chamber using the plurality of probes in the consumable part of claim 12 ; and monitoring signals from the plurality of probes simultaneously.

Assignees

Inventors

Classifications

  • including measuring or testing of device or component part · CPC title

  • Corrosion probes · CPC title

  • G01N27/20Primary

    Investigating the presence of flaws · CPC title

  • Investigating resistance of materials to the weather, to corrosion, or to light · CPC title

  • using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

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What does patent US9541514B2 cover?
Apparatus and methods for diagnosing status of a consumable part of a plasma reaction chamber, the consumable part including at least one conductive element embedded therein. The method includes the steps of: coupling the conductive element to a power supply so that a bias potential relative to the ground is applied to the conductive element; exposing the consumable part to plasma erosion until…
Who is the assignee on this patent?
Lam Res Corp, I Am Res Corp
What technology area does this patent fall under?
Primary CPC classification G01N27/20. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).