Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

US9540339B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9540339-B2
Application numberUS-201615005177-A
CountryUS
Kind codeB2
Filing dateJan 25, 2016
Priority dateAug 12, 2011
Publication dateJan 10, 2017
Grant dateJan 10, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

First claim

Opening claim text (preview).

The invention claimed is: 1. A compound represented by formula (1) or formula (2): wherein R 1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms; R 2 are each independently a hydrogen atom, a halogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group and may be the same or different on the same naphthalene ring; at least two of R 2 on at least one of the naphthalene moieties is a hydroxyl group in the formula (1); at least one of R 2 is a hydroxyl group in the formula (2); n is an integer of 2 to 4; the structural formulas of the repeating units in the formulas (1) and (2) may be the same or different; in the formula (1), m 1 are each independently an integer of 1 to 7; and in the formula (2), X are each independently an oxygen atom or a sulfur atom, and m 2 are each independently an integer of 1 to 6. 2. The compound according to claim 1 , wherein the formula (1) is the general formula (1-1), and the formula (2) is the formula (2-1): wherein R 1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms; R 3 are each independently a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an alkenyl group having 2 to 10 carbon atoms and may be the same or different on the same naphthalene ring; the structural formulas of the repeating units in the formulas (1-1) and (2-1) may be the same or different; n is an integer of 2 to 4; in the formula (1-1), m 3 are each independently an integer of 2 to 7, m 4 are each independently an integer of 0 to 6, and m 3 +m 4 is an integer of 2 to 7; and in the formula (2-1), m 5 are each independently an integer of 1 to 6, m 6 are each independently an integer of 0 to 5, and m 5 +m 6 is an integer of 1 to 6. 3. The compound according to 1 , wherein the formula (2) is the formula (2-2): wherein R 1 is a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms; R 3 are each independently a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an alkenyl group having 2 to 10 carbon atoms and may be the same or different on the same naphthalene ring; the structural formulas of the repeating units in the formula (2-2) may be the same or different; n is an integer of 2 to 4; and in the formula (2-2), m 6 are each independently an integer of 0 to 5.

Assignees

Inventors

Classifications

  • containing other rings in addition to the six-membered aromatic rings {, e.g. cyclohexylphenol} · CPC title

  • with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

  • The ring being saturated · CPC title

  • C07C37/20Primary

    using aldehydes or ketones · CPC title

  • the ring being unsaturated · CPC title

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Frequently asked questions

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What does patent US9540339B2 cover?
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
Who is the assignee on this patent?
Mitsubishi Gas Chemical Co
What technology area does this patent fall under?
Primary CPC classification C07C37/20. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).