Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition

Patent metadata

Field	Value
Publication number	US-9469592-B2
Application number	US-201314415337-A
Country	US
Kind code	B2
Filing date	Jun 25, 2013
Priority date	Jul 25, 2012
Publication date	Oct 18, 2016
Grant date	Oct 18, 2016

Abstract

Provided is a positive photoresist composition excellent in terms of heat resistance. A radically curable compound is represented by a general formula (1) below (where R 1 , R 2 , and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; X, Y, and Z each independently represent an acryloyloxy group, a methacryloyloxy group, or a hydroxy group, and at least one of X, Y, and Z represents an acryloyloxy group or a methacryloyloxy group; and t represents 1 or 2).

First claim

The invention claimed is:

1. A radically curable compound represented by a general formula (1) below

where R 1 , R 2 , and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; X, Y, and Z each independently represent an acryloyloxy group or a methacryloyloxy group; and t represents 1 or 2.

2. A radically curable compound represented by a general formula (2) below

where R 1 , R 2 , and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; and X, Y, and Z each independently represent an acryloyloxy group, a methacryloyloxy group, or a hydroxy group, and at least one of X, Y, and Z represents an acryloyloxy group or a methacryloyloxy group; and t represents 1 or 2, wherein at least one hydroxyl group is not in the ortho-position with respect to the center.

3. The radically curable compound according to claim 1 , wherein R 1 , R 2 , and R 3 above each represent a methyl group.

4. A radically curable compound represented by a general formula (1) below

where R 1 , R 2 , and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms; m, n, and p each independently represent an integer of 1 to 3; X, Y, and Z each independently represent an acryloyloxy group, a methacryloyloxy group, or a hydroxy group, and at least one of X, Y, and Z represents an acryloyloxy group or a methacryloyloxy group; and t represents 1 or 2, wherein at least one hydroxyl group is not in the ortho-position with respect to the center.

5. A radically curable composition comprising the radically curable compound according to claim 1 .

6. A cured product obtained by curing the radically curable composition according to claim 5 with an active energy ray or heat.

7. A resist-material composition comprising the radically curable composition according to claim 5 .

8. A radically curable composition comprising the radically curable compound according to claim 2 .

9. A radically curable composition comprising the radically curable compound according to claim 3 .

10. A radically curable composition comprising the radically curable compound according to claim 4 .

11. A cured product obtained by curing the radically curable composition according to claim 8 with an active energy ray or heat.

12. A radically curable compound represented by a general formula (1) below

where R 1 , R 2 , and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; X, Y, and Z each independently represent an acryloyloxy group, a methacryloyloxy group, or a hydroxy group, and only one of X, Y, and Z represents a hydroxy group; and t represents 1 or 2, wherein the hydroxyl group is not in the ortho-position with respect to the center.

13. The radically curable compound according to claim 2 , wherein R 1 , R 2 , and R 3 above each represent a methyl group.

14. The radically curable compound according to claim 4 , wherein R 1 , R 2 , and R 3 above each represent a methyl group.

15. The radically curable compound according to claim 12 , wherein R 1 , R 2 , and R 3 above each represent a methyl group.

16. A radically curable composition comprising the radically curable compound according to claim 12 .

17. A resist-material composition comprising the radically curable composition according to claim 8 .

18. A resist-material composition comprising the radically curable composition according to claim 10 .

19. A resist-material composition comprising the radically curable composition according to claim 13 .

20. A resist-material composition comprising the radically curable composition according to claim 14 .

Assignees

• Dainippon Ink & Chemicals

Inventors

• Imada Tomoyuki
• Kage Takakazu
• SHIN Dongmi

Classifications

• C07C67/14 Primary

  from carboxylic acid halides · CPC title

• C08F22/14

  Esters having no free carboxylic acid groups · CPC title

• C07C69/54 Primary

  Acrylic acid esters; Methacrylic acid esters · CPC title

• C08F222/1006

  of polyhydric alcohols or polyhydric phenols · CPC title

• C07C37/002

  by transformation of a functional group, e.g. oxo, carboxyl · CPC title