Polishing pad

US9539693B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9539693-B2
Application numberUS-201414761292-A
CountryUS
Kind codeB2
Filing dateJan 15, 2014
Priority dateJan 29, 2013
Publication dateJan 10, 2017
Grant dateJan 10, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A polishing pad has a polishing layer that is formed of a polyurethane foam having fine cells. The polyurethane foam is a reaction cured body of a chain extender and an isocyanate-terminated prepolymer which is obtained by reacting a prepolymer starting material composition that contains an isocyanate component, a high molecular weight polyol and an aliphatic diol. The high molecular weight polyol contains a polyalkylene glycol A that has a peak of the molecular weight distribution within the range of 200 to 300 and a polyalkylene glycol B that has a peak of the molecular weight distribution within the range of 800 to 1200.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a polishing pad, comprising the steps of: (C) synthesizing an isocyanate-terminated prepolymer and (D) mixing a first component containing the isocyanate-terminated prepolymer with a second component containing a chain extender and curing the mixture to prepare a polyurethane foam, wherein: the step (C) comprises reacting an isocyanate component with an aliphatic diol and a polyalkylene glycol A that has number average molecular weight within the range of 200 to 300 to synthesize a prepolymer precursor and then reacting the prepolymer precursor with a polyalkylene glycol B that has a number average molecular weight within the range of 800 to 1200 to synthesize the isocyanate-terminated prepolymer, and the step (D) comprises adding 3 to 10 parts by weight of a silicone-based surfactant based on 100 parts by weight of the isocyanate-terminated prepolymer, to the first component containing the isocyanate-terminated prepolymer, further stirring the first component together with a non-reactive gas to form a cell dispersion liquid in which the non-reactive gas is dispersed in the form of fine cells, then mixing the second component containing the chain extender into the cell dispersion liquid, and curing the mixture to prepare a polyurethane foam. 2. The method according to claim 1 , wherein the aliphatic diol is 1,4-butanediol. 3. The method according to claim 1 , wherein the blending amount of the aliphatic diol is 1 to 7% by weight in the prepolymer starting material composition. 4. The method according to claim 1 , wherein the isocyanate component contains an aromatic diisocyanate and an aliphatic diisocyanate and/or an alicyclic diisocyanate. 5. The method according to claim 1 , wherein the polyurethane foam has an average cell diameter of 20 to 70 μm and a cut rate of 2 μm/min or less. 6. The method according to claim 1 , wherein the polyurethane foam has a hardness reduction rate of 20% or less at water absorption and a breaking strength reduction rate of 20% or less at water absorption.

Assignees

Inventors

Classifications

  • Polyurethanes · CPC title

  • Hydrogen, oxygen, CO2, nitrogen or noble gases · CPC title

  • without embedded abrasive particles (B24D11/005 takes precedence) · CPC title

  • of semiconductor materials · CPC title

  • Polymeric products of isocyanates or isothiocyanates · CPC title

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Frequently asked questions

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What does patent US9539693B2 cover?
A polishing pad has a polishing layer that is formed of a polyurethane foam having fine cells. The polyurethane foam is a reaction cured body of a chain extender and an isocyanate-terminated prepolymer which is obtained by reacting a prepolymer starting material composition that contains an isocyanate component, a high molecular weight polyol and an aliphatic diol. The high molecular weight pol…
Who is the assignee on this patent?
Toyo Tire & Rubber Co, Rohm & Haas Elect Materials Cmp Holdings Inc
What technology area does this patent fall under?
Primary CPC classification B24B37/24. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).