Semiconductor devices including a stressor in a recess and methods of forming the same

Patent metadata

Field	Value
Publication number	US-9537009-B2
Application number	US-201514955289-A
Country	US
Kind code	B2
Filing date	Dec 1, 2015
Priority date	Nov 22, 2012
Publication date	Jan 3, 2017
Grant date	Jan 3, 2017

Abstract

Semiconductor devices including a stressor in a recess and methods of forming the semiconductor devices are provided. The methods may include forming a fast etching region comprising phosphorous in an active region and forming a first trench in the active region by recessing the fast etching region. The methods may also include forming a second trench in the active region by enlarging the first trench using a directional etch process and forming a stressor in the second trench. The second trench may include a notched portion of the active region.

First claim

What is claimed is:

1. A semiconductor device comprising:
a substrate comprising an upper surface;
a gate structure over the substrate;
a spacer along a sidewall of the gate structure; and
a semiconductor layer disposed adjacent to the sidewall of the gate structure and disposed in a recess that extends below the upper surface of the substrate, the semiconductor layer being a strain-inducing pattern,
wherein the semiconductor layer in the recess comprises a first sidewall that directly contacts the spacer and has a linear shape and a second sidewall that directly contacts the first sidewall and has a linear shape, and the first and second sidewalls are slanted with respect to the upper surface of the substrate,
wherein the semiconductor layer in the recess comprises a first portion that is bounded by the first sidewall and has a width increasing with a depth of the recess and a second portion that is bounded by the second sidewall and has a width decreasing with the depth of the recess, and the gate structure overlaps an interface between the first and second sidewalls,
wherein the first portion of the semiconductor layer directly contacts the spacer, and an interface between the spacer and the first portion of the semiconductor layer is not below the upper surface of the substrate, and
wherein a width of the spacer tapers at an upper end of the spacer.

2. The semiconductor device of claim 1 , wherein the interface between the spacer and the first portion of the semiconductor layer is coplanar with the upper surface of the substrate.

3. The semiconductor device of claim 1 , further comprising at least one nitride layer between the spacer and the gate structure.

4. The semiconductor device of claim 1 , wherein the spacer includes a nitride.

5. The semiconductor device of claim 1 , wherein the sidewall of the gate structure comprises a first sidewall of the gate structure, the spacer comprises a first spacer along the first sidewall of the gate structure, the recess comprises a first recess, and the semiconductor layer comprises a first semiconductor layer in the first recess, and
wherein the semiconductor device further comprises:
a second spacer along a second sidewall of the gate structure opposite the first sidewall of the gate structure; and
a second semiconductor layer disposed adjacent to the second sidewall of the gate structure and disposed in a second recess that extends below the upper surface of the substrate, the second semiconductor layer being the strain-inducing pattern,

wherein the second semiconductor layer directly contacts the second spacer, and an interface between the second spacer and the second semiconductor layer
is not below the upper surface of the substrate.

6. The semiconductor device of claim 1 , further comprising a lightly doped drain (LDD) region in the substrate, wherein both the first portion and the second portion of the semiconductor layer directly contact the LDD region.

7. The semiconductor device of claim 1 , wherein the first and second sidewalls of the semiconductor layer are in the same crystal plane.

8. The semiconductor device of claim 5 , wherein the first spacer includes oxide, and the second spacer includes nitride.

9. The semiconductor device of claim 6 , wherein the LDD region comprises a first impurity having a p-conductivity type and phosphorous (P).

10. The semiconductor device of claim 6 , wherein the LDD region comprises a first impurity having a p-conductivity type, and the spacer comprises phosphorous (P).

11. The semiconductor device of claim 9 , wherein a phosphorous concentration in the LDD region is in a range of from 5E18 to 1E19 atoms/cm 3 .

12. A method for forming a semiconductor device, the method comprising:
forming a gate structure over a semiconductor substrate;
forming a first spacer on the semiconductor substrate;
forming a second spacer along a sidewall of the gate structure and on the first spacer;
forming a recess extending into the semiconductor substrate, adjacent to the gate structure, wherein the recess comprises a notched portion of the semiconductor substrate under the gate structure, and
wherein the notched portion comprises a first sidewall directly contacting an upper surface of the semiconductor substrate and a second sidewall directly contacting the first sidewall, and each of the first and second sidewalls has a linear shape;
removing at least a portion of the first spacer; and
filling the recess with a stressor that forms an interface with the first spacer, wherein the gate structure is spaced apart from the stressor and overlaps a portion of the stressor, and
wherein the interface between the stressor and the first spacer is not below the upper surface of the semiconductor substrate.

13. The method of claim 12 , wherein the forming the recess includes performing an anisotropic etch process, whereby the recess extends under the first spacer.

14. The method of claim 12 , wherein the first spacer includes oxide, and the second spacer includes nitride.

15. The method of claim 12 , further comprising forming a nitride layer along the sidewall of the gate structure.

16. The method of claim 12 , wherein the sidewall of the gate structure comprises a first sidewall, the recess comprises a first recess, and the stressor comprises a first stressor,
wherein the method further comprises:
forming a third spacer along a second sidewall of the gate structure opposite the first sidewall of the gate structure;
forming a second recess extending into the semiconductor substrate, adjacent to the second sidewall of the gate structure; and
filling the second recess with a second stressor that forms an interface with the third spacer,
wherein the interface between the second stressor and the third spacer is not below the upper surface of the semiconductor substrate.

17. The method of claim 12 , wherein the first sidewall and the second sidewall of the notched portion converge at a convergence interface, and
wherein a distance between a lower surface of the gate structure and the convergence interface is from 3 nm to 7 nm.

18. The method of claim 12 , further comprising forming a lightly doped drain (LDD) region in the semiconductor substrate before forming the recess, wherein the first sidewall and the second sidewall of the notched portion expose the LDD region.

19. The method of claim 18 , wherein the LDD region comprises a first impurity having a p-conductivity type and phosphorous (P).

20. The method of claim 15 , wherein the gate structure includes a high-K dielectric material.

21. A method for forming a semiconductor device, the method comprising:
forming a gate structure over a semiconductor substrate;
forming a first spacer on the semiconductor substrate;
forming a second spacer along a sidewall of the gate structure and over the first spacer;
forming at least one recess adjacent to the gate structure, the at least one recess extending into the semiconductor substrate and extending under the first spacer, wherein the at least one recess comprises a notched portion of the semiconductor substrate under the gate structure, and
wherein the notched portion comprises a first sidewall and a second sidewall, and each of the first and second sidewalls has a linear shape;
removing at least a portion of the first spacer; and
filling the at least one recess with a stressor that forms an interface with the first spacer, wherein the gate structure is spaced apart from the stressor and overlaps a

Assignees

• Shin Dong-Suk
• Lee Chul-Woong
• Chung Hoi-Sung
• Kim Young-Tak
• Lee Nae-In
• Samsung Electronics Co Ltd

Inventors

• Shin Dong-Suk
• Lee Chul-Woong
• Chung Hoi-Sung
• Kim Young-Tak
• Lee Nae-In

Classifications

• H10P50/642

  Chemical etching · CPC title

• H10P14/27

  using selective deposition, e.g. simultaneous growth of monocrystalline and non-monocrystalline semiconductor materials · CPC title

• H10D30/62

  Fin field-effect transistors [FinFET] · CPC title

• H10D30/797 Primary

  being in source or drain regions, e.g. SiGe source or drain · CPC title

• H10D30/024

  of fin field-effect transistors [FinFET] · CPC title