System and method for calibrating charge-regulating module

US9536697B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9536697-B2
Application numberUS-201514716385-A
CountryUS
Kind codeB2
Filing dateMay 19, 2015
Priority dateMay 19, 2015
Publication dateJan 3, 2017
Grant dateJan 3, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

This invention provides a system and a method for calibrating charge-regulation module in vacuum environment. Means for mounting the charge-regulation module provides motions to the charge-regulation module such that a beam spot, illuminated by the charge-regulation module, on a sample surface can be moved to a pre-determined position which is irradiated by a charged particle beam.

First claim

Opening claim text (preview).

What is claimed is: 1. A system for calibrating a charge-regulating module, comprising: means for mounting a Laser and providing motions to move the Laser, wherein the Laser illuminates a beam on a surface of a sample with a beam spot thereon, and regulates charges on the sample surface; a detector for receiving a reflected beam from the beam spot on the sample surface; a controller, coupled to the detector, for receiving signals from the detector, calculating a position of the beam spot, and controlling the beam spot to a pre-determined location; and a transmission, coupled to the controller, and driving the mounting means such that the beam spot is moved to the pre-determined location. 2. The system of claim 1 , wherein the mounting means is fastened to an objective lens of a charged particle beam tool, and the pre-determined location is irradiated by a charged particle beam of the charged particle beam tool. 3. The system of claim 2 , wherein the charged particle beam tool is an ebeam inspection tool. 4. The system of claim 3 , wherein the sample is a wafer or a mask. 5. The system of claim 4 , wherein the mounting means includes a first motor for driving the Laser with a rotational motion, and a second motor for driving the Laser with a vertical motion. 6. The system of claim 5 , wherein the transmission is a hollow rod within wires for providing powers and instructions to the first and second motors. 7. The system of claim 4 , wherein the mounting means is a C-shape mount and the Laser is fastened thereto. 8. The system of claim 7 , wherein the transmission includes a rotation-to-translation means. 9. The system of claim 8 , wherein the transmission includes a carved body fastened to the rotation-to-translation means and engaged to the C-shape mount. 10. The system of claim 9 , wherein a portion of the C-shape mount is engaged with the carved body. 11. The system of claim 10 , wherein the portion of the C-shape mount is forced to distort in vertical motion and the portion of the C-shape mount is forced to expand with horizontal motion. 12. An ebeam inspection tool, comprising: an electron tip for providing an electron source; an anode for extracting the electron source as a primary electron beam; a condenser lens for condensing the primary electron beam; a magnetic objective lens for focusing the primary electron beam on a surface of a sample; a charge-regulation module, fastened to the magnetic objective lens, for regulating charges on the sample surface; and a system for calibrating the charge-regulation module, includes: means for mounting the charge-regulation module and providing motions to move the charge-regulation module, wherein the charge-regulation module illuminates a beam on a surface of a sample with a beam spot thereon; a detector for receiving a reflected beam from the beam spot on the sample surface; a controller, coupled to the detector, for receiving signals from the detector, calculating a position of the beam spot, and controlling the beam spot to a pre-determined location; and a transmission, coupled to the controller, and driving the mounting means such that the beam spot is moved to the pre-determined location. 13. The ebeam inspection tool of claim 12 , wherein the sample is a wafer or a mask. 14. The ebeam inspection tool of claim 13 , wherein the mounting means includes a first motor for driving the charge-regulation module with a rotational motion, and a second motor for driving the charge-regulation module with a vertical motion. 15. The ebeam inspection tool of claim 14 , wherein the transmission is a hollow rod within wires for providing powers and instructions to the first and second motors. 16. The ebeam inspection tool of claim 13 , wherein the mounting means is a C-shape mount and the charge-regulation module is fastened thereto. 17. The ebeam inspection tool of claim 16 , wherein the transmission includes a rotation-to-translation means. 18. The ebeam inspection tool of claim 17 , wherein the transmission includes a carved body fastened to the rotation-to-translation means and engaged to the C-shape mount. 19. The ebeam inspection tool of claim 18 , wherein a portion of the C-shape mount is engaged with the carved body. 20. The ebeam inspection tool of claim 19 , wherein the portion of the C-shape mount is forced to distort in vertical motion and the portion of the C-shape mount is forced to expand with horizontal motion. 21. A method for calibrating a charge-regulation module under vacuum environment, comprising: providing a beam on a surface of a sample by the charge-regulation module to form a beam spot on the surface, wherein the beam spot regulates charges on the sample surface; detecting a location of the beam spot according to a reflection of the beam from the sample surface; calculating a pre-determined position of a charged particle beam on the surface; and driving the charge-regulation module such that the beam spot moves to the pre-determined position.

Assignees

Inventors

Classifications

  • Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination · CPC title

  • H01J37/026Primary

    Means for avoiding or neutralising unwanted electrical charges on tube components · CPC title

  • using electromagnetic radiations, e.g. UV, X-rays, light · CPC title

  • with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

  • Moving components not otherwise provided for · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9536697B2 cover?
This invention provides a system and a method for calibrating charge-regulation module in vacuum environment. Means for mounting the charge-regulation module provides motions to the charge-regulation module such that a beam spot, illuminated by the charge-regulation module, on a sample surface can be moved to a pre-determined position which is irradiated by a charged particle beam.
Who is the assignee on this patent?
Hermes Microvision Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/026. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 03 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).