Method for measuring surface parameter of copper foil, and method for sorting copper foil
US-2024418504-A1 · Dec 19, 2024 · US
Method and apparatus for inspecting a substrate
US9529279B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9529279-B2 |
| Application number | US-54278506-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 4, 2006 |
| Priority date | Dec 15, 2000 |
| Publication date | Dec 27, 2016 |
| Grant date | Dec 27, 2016 |
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Abstract
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A method and apparatus for inspection and review of defects is disclosed wherein data gathering is improved. In one embodiment, multiple or segmented detectors are used in a particle beam system.
First claim
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We claim the following inventions: 1. A method of inspecting and/or characterizing a substrate, wherein said substrate includes a plurality of substantially identical features, the method comprising: obtaining a first dataset wherein said first dataset includes data derived from an image collected by a first detector of a first region of said substrate, and wherein said region includes an array of substantially identical repeating features; obtaining a second dataset, wherein sa…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9529279B2 cover?
- A method and apparatus for inspection and review of defects is disclosed wherein data gathering is improved. In one embodiment, multiple or segmented detectors are used in a particle beam system.
- Who is the assignee on this patent?
- Adler David, Bertsche Kirk, Mccord Mark, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G01N21/956. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Dec 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).