Fringing field assisted dielectrophoresis assembly of carbon nanotubes

US9525147B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9525147-B2
Application numberUS-201514615554-A
CountryUS
Kind codeB2
Filing dateFeb 6, 2015
Priority dateSep 25, 2014
Publication dateDec 20, 2016
Grant dateDec 20, 2016

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Abstract

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A method of arranging at least one carbon nanotube on a semiconductor substrate includes depositing the at least one carbon nanotube on a dielectric layer of the semiconductor device. The method further includes arranging the at least one carbon nanotube on the dielectric layer in response to applying a voltage potential to an electrically conductive electrode of the semiconductor device, and applying a ground potential to an electrically conductive semiconductor layer of the semiconductor device.

First claim

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What is claimed is: 1. A method of arranging at least one carbon nanotube on a semiconductor device, the method comprising: depositing a solution containing a plurality of single-walled nanotubes on a dielectric layer and on a portion of the conductive electrode covered by a dielectric film; and arranging the at least one carbon nanotube on the dielectric layer in response to applying a voltage potential to an electrically conductive electrode of the semiconductor device, and applying a ground potential to an electrically conductive semiconductor layer of the semiconductor device. 2. The method of claim 1 , wherein the applying a voltage potential includes using only a single contiguous metal electrode to receive the voltage potential. 3. The method of claim 1 , wherein the arranging the at least one carbon nanotube includes self-aligning the single-walled nanotubes in monolayer aligned arrays. 4. The method of claim 3 , further comprising self-aligning the single-walled nanotubes according to a uniform pitch. 5. The method of claim 4 , wherein the self-aligning the single-walled nanotubes further comprises defining an average pitch ranging from about 20 nanometers with respect to each single-walled nanotube. 6. The method of claim 5 , further comprising arranging the single-walled nanotubes between a source contact and a drain contact formed on the dielectric film such that the single-walled nanotubes define gate channels between the source contact and the drain contact.

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What does patent US9525147B2 cover?
A method of arranging at least one carbon nanotube on a semiconductor substrate includes depositing the at least one carbon nanotube on a dielectric layer of the semiconductor device. The method further includes arranging the at least one carbon nanotube on the dielectric layer in response to applying a voltage potential to an electrically conductive electrode of the semiconductor device, and a…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification H01L51/0545. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).