Support for capillary self-assembly with horizontal stabilisation, fabrication method and use

US9522450B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9522450-B2
Application numberUS-201414221402-A
CountryUS
Kind codeB2
Filing dateMar 21, 2014
Priority dateMar 25, 2013
Publication dateDec 20, 2016
Grant dateDec 20, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A support is provided, including a reception zone in which the external envelope matches the shape of a plate configured to be placed on a droplet deposited at least in the reception zone in order to achieve capillary self-assembly of the plate and the support, and at least one pair of tracks that extend on the support from the reception zone and that have a lyophilic-type affinity with the droplet such that an overflow of the droplet beyond the reception zone is guided in the tracks, wherein the at least one pair of tracks includes a first track and a second track that do not have the same lyophilic-type degree of affinity with the droplet.

First claim

Opening claim text (preview).

The invention claimed is: 1. A support comprising a reception zone having an external envelope matching a shape of a plate designed to be placed on a droplet deposited at least in the reception zone in order to achieve capillary self-assembly of the plate and the support, and at least one pair of tracks that extend on the support from the reception zone and that have a lyophilic affinity with the droplet such that an overflow of the droplet beyond the reception zone is guided in the tracks, wherein the at least one pair of tracks comprises a first track and a second track that do not have a same lyophilic degree of affinity with the droplet. 2. The support according to claim 1 , wherein the at least one pair of tracks and at least part of the reception zone have a lyophilic affinity with the droplet. 3. The support according to claim 1 , wherein the first track and the second track extend on each side of the reception zone prolonging each other along a single direction. 4. The support according to claim 3 , comprising at least two pairs of tracks extending in a plane of the support. 5. The support according to claim 4 , comprising two pairs of tracks extending along approximately perpendicular directions in the support plane of the support. 6. The support according to claim 1 , comprising a plurality of contiguous patterns, wherein each pattern is delimited by a periphery inside which the external envelope of a reception zone is circumscribed, the at least one pair of tracks extending from the reception zone as far as the periphery of the pattern. 7. The support according to claim 1 , wherein the first and the second tracks do not have the same width. 8. The support according to claim 1 , wherein the first and the second tracks are made from different materials. 9. The support according to claim 1 , comprising an electro-capillary device associated with each track so that the lyophilic degree of affinity with the droplet can be modified. 10. A method for capillary self-assembly of a plate on a support according to claim 1 , said method comprising: depositing at least one droplet in the support reception zone; placing the plate on the droplet. 11. The method according to claim 10 , wherein the support has a plurality of patterns, wherein each pattern is delimited by a periphery inside which the external envelope of a reception zone is circumscribed, the at least one pair of tracks extending from the reception zone as far as the periphery of the pattern, and in which global wetting of the support is done to place a droplet in each reception zone. 12. The method according to claim 10 , wherein the substrate support has a plurality of patterns, wherein each pattern is delimited by a periphery to inside which the external envelope of the reception zone is circumscribed, the at least one pair of tracks extending from the reception zone as far as the periphery of the pattern, and wherein a plurality of plates is collectively placed. 13. A method of forming a support comprising a reception zone having an external envelope matching a shape of a plate to be placed on a droplet deposited in the reception zone for capillary self-assembly of the plate and the support, said method comprising forming at least one pair of tracks extending on the support from the reception zone and having a lyophilic affinity with the droplet such that an overflow of the droplet outside the reception zone is guided in the tracks, the at least one pair of tracks comprising a first track and a second track that do not have the same lyophilic degree of affinity with the droplet. 14. The method according to claim 13 , further comprising forming the first track and the second track such that they extend on each side of the reception zone prolonging each other, and wherein said first and second tracks are not subjected to a same surface treatment such that said first and second tracks have a different lyophilic degree of affinity with the droplet.

Assignees

Inventors

Classifications

  • for work-holder for assembly or disassembly · CPC title

  • Chip component · CPC title

  • B23Q3/02Primary

    for mounting on a work-table, tool-slide, or analogous part (B23Q3/15 takes precedence) · CPC title

  • Work holding · CPC title

  • Coating · CPC title

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Frequently asked questions

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What does patent US9522450B2 cover?
A support is provided, including a reception zone in which the external envelope matches the shape of a plate configured to be placed on a droplet deposited at least in the reception zone in order to achieve capillary self-assembly of the plate and the support, and at least one pair of tracks that extend on the support from the reception zone and that have a lyophilic-type affinity with the dro…
Who is the assignee on this patent?
Commissariat A L'Energie Atomique Et Aux Ene Alt, St Microelectronics Crolles 2 Sas, Commissariat A' L'Energie Atomique Et Aux Energies Alternatives
What technology area does this patent fall under?
Primary CPC classification B23Q3/02. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).