Photo emitter X-ray source array (PeXSA)

US9520260B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9520260-B2
Application numberUS-201314026697-A
CountryUS
Kind codeB2
Filing dateSep 13, 2013
Priority dateSep 14, 2012
Publication dateDec 13, 2016
Grant dateDec 13, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A photo-emitter x-ray source is provided that includes a photocathode electron source, a laser light source, where the laser light source illuminates the photocathode electron source to emit electrons, and an X-ray target, where the emitted electrons are focused on the X-ray target, where the X-ray target emits X-rays. The photocathode electron source can include alkali halides (such as CsBr and CsI), semiconductors (such as GaAs, InP), and theses materials modified with rare Earth element (such as Eu) doping, electron beam bombardment, and X-ray irradiation, and has a form factor that includes planar, patterned, or optically patterned. The X-ray target includes a material such as tungsten, copper, rhodium or molybdenum. The laser light source is pulsed or configured by light modulators including acousto-optics, mode-locking, micro-mirror array, and liquid crystals, the photocathode electron source includes a nano-aperture or nano-particle arrays, where the nano-aperture is a C-aperture or a circular aperture.

First claim

Opening claim text (preview).

What is claimed: 1. A photo-emitter x-ray source, comprising: a. a photocathode electron source; b. a laser light source; c. a beam forming device comprising a spatial light modulator; d. electron optics; and e. an X-ray target, wherein said laser light source outputs a beam directed to said spatial light modulator, wherein said spatial light modulator forms said beam into an optical spatially patterned beam, wherein said optical spatially patterned beam illuminates said photocathode electron source, wherein said photocathode electron source emits electrons having an electron pattern according to said spatial light modulator, wherein said electron optics comprises an electric field, a magnetic field, or said electric field and said magnetic field disposed to image said electron pattern onto said X-ray target, wherein said X-ray target emits a pattern of X-rays, wherein said pattern of X-rays comprise a patterned partially-coherent X-ray beam. 2. The photo-emitter x-ray source of claim 1 , wherein said photocathode electron source comprises a material selected from the group consisting of alkali halides, GaAs, InP, rare Earth element doped alkali halides, rare Earth element doped GaAs, rare Earth element doped InP, alkali halides modified by electron beam bombardment, GaAs modified by electron beam bombardment, InP modified by electron beam bombardment, alkali halides modified by X-ray irradiation, GaAs modified by X-ray irradiation, and InP modified by X-ray irradiation. 3. The photo-emitter x-ray source of claim 1 , wherein said photocathode electron source comprises a material capable of operating at energies below a bandgap of said material through doped states or color centers created by UV irradiations, X-rays irradiations, gamma rays irradiations or electron bombardment. 4. The photo-emitter x-ray source of claim 1 , wherein said emitted pattern of X-rays comprise energies below 250 KeV. 5. The photo-emitter x-ray source of claim 1 , wherein said electron optics are configured to focus the electrons emitted from the photocathode electron source to a spot size in a range between 20 nm to 5 mm. 6. The photo-emitter x-ray source of claim 1 , wherein said laser light source emitting a radiation at a wavelength in a range of 200 nm to 800 nm. 7. The photo-emitter x-ray source of claim 1 , wherein said beam forming device comprises a nano-aperture disposed directly on said photocathode electron source, wherein said nano-aperture comprises one of nano-particle arrays, a C-aperture, or a circular aperture. 8. The photo-emitter X-ray source of claim 1 , wherein said X-ray target comprises a material selected from the group consisting of tungsten, copper, rhodium and molybdenum. 9. The photo-emitter X-ray source of claim 1 , wherein said photocathode electron source comprises a form factor selected from the group consisting of planar, patterned, and optically patterned. 10. The photo-emitter X-ray source of claim 1 , wherein said laser light source is temporally modulated.

Assignees

Inventors

Classifications

  • H01J35/065Primary

    Field emission, photo emission or secondary emission cathodes · CPC title

  • Arrangements for concentrating, focusing, or directing the cathode ray · CPC title

  • Cathodes · CPC title

  • Electricity · mapped topic

  • H01J35/02Primary

    Details · CPC title

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Frequently asked questions

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What does patent US9520260B2 cover?
A photo-emitter x-ray source is provided that includes a photocathode electron source, a laser light source, where the laser light source illuminates the photocathode electron source to emit electrons, and an X-ray target, where the emitted electrons are focused on the X-ray target, where the X-ray target emits X-rays. The photocathode electron source can include alkali halides (such as CsBr an…
Who is the assignee on this patent?
Univ Leland Stanford Junior
What technology area does this patent fall under?
Primary CPC classification H01J35/065. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 13 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).