Method for rapid laser drilling of holes in glass and products made therefrom

US9517963B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9517963-B2
Application numberUS-201414535754-A
CountryUS
Kind codeB2
Filing dateNov 7, 2014
Priority dateDec 17, 2013
Publication dateDec 13, 2016
Grant dateDec 13, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Forming holes in a material includes focusing a pulsed laser beam into a laser beam focal line oriented along the beam propagation direction and directed into the material, the laser beam focal line generating an induced absorption within the material, the induced absorption producing a defect line along the laser beam focal line within the material, and translating the material and the laser beam relative to each other, thereby forming a plurality of defect lines in the material, and etching the material in an acid solution to produce holes greater than 1 micron in diameter by enlarging the defect lines in the material. A glass article includes a stack of glass substrates with formed holes of 1-100 micron diameter extending through the stack.

First claim

Opening claim text (preview).

What is claimed is: 1. An article comprising: a substrate having a plurality of etched through-holes continuously extending from a first surface of the substrate to a second surface of the substrate, wherein: the substrate is transparent to at least one wavelength in a range from 390 nm to 700 nm; the plurality of etched through-holes have a diameter of 20 μm or less; a spacing between adjacent etched through-holes of 10 μm or greater; the plurality of etched through-holes comprise an opening in the first surface, an opening in the second surface, and a waist located between the opening in the first surface and the opening in the second surface; a diameter of the waist is at least 50% of the diameter of the opening in the first surface or the opening in the second surface; and a difference between a diameter of the opening in the first surface and a diameter of the opening in the second surface is 3 μm or less. 2. The article of claim 1 , wherein the plurality of etched through-holes have a diameter greater than 5 μm. 3. The article of claim 1 , wherein the diameter of the waist is at least 70% of the diameter of the opening of the first surface or the opening in the second surface. 4. The article of claim 1 , wherein the diameter of the waist is at least 75% of the diameter of the opening of the first surface or the opening in the second surface. 5. The article of claim 1 , wherein the diameter of the waist is at least 80% of the diameter of the opening of the first surface or the opening in the second surface. 6. The article of claim 1 , wherein the substrate is fused silica. 7. The article of claim 1 , wherein the substrate is glass. 8. The article of claim 1 , wherein the glass is a chemically strengthened glass. 9. The article of claim 1 , wherein the substrate has a thickness of 1 mm or less. 10. The article of claim 1 , wherein the substrate has a thickness in a range from 20 μm to 200 μm. 11. The article of claim 1 , wherein the plurality of etched through-holes have a density in a range from 5 through-holes/mm 2 to 50 through-holes/mm 2 . 12. The article of claim 1 , wherein the plurality of etched through-holes have a diameter of 15 μm or less. 13. The article of claim 1 , wherein the plurality of etched through-holes have a diameter of 10 μm or less. 14. The article of claim 1 , wherein the plurality of etched through-holes have an aspect ratio in a range from 5:1 to 20:1. 15. The article of claim 1 , wherein the plurality of etched through-holes contain a conductive material. 16. The article of claim 1 , wherein the plurality of etched through-holes have an aperiodic pattern.

Assignees

Inventors

Classifications

  • Scoring using a focussed radiation beam, e.g. laser · CPC title

  • Composite web or sheet · CPC title

  • for creating voids inside the workpiece, e.g. for forming flow passages or flow patterns · CPC title

  • including aperture · CPC title

  • Inorganic materials other than metals or composite materials · CPC title

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What does patent US9517963B2 cover?
Forming holes in a material includes focusing a pulsed laser beam into a laser beam focal line oriented along the beam propagation direction and directed into the material, the laser beam focal line generating an induced absorption within the material, the induced absorption producing a defect line along the laser beam focal line within the material, and translating the material and the laser b…
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03B33/091. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 13 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).