Active regions with compatible dielectric layers

Patent metadata

Field	Value
Publication number	US-9515142-B2
Application number	US-201615199168-A
Country	US
Kind code	B2
Filing date	Jun 30, 2016
Priority date	Feb 17, 2005
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

A method to form a semiconductor structure with an active region and a compatible dielectric layer is described. In one embodiment, a semiconductor structure has a dielectric layer comprised of an oxide of a first semiconductor material, wherein a second (and compositionally different) semiconductor material is formed between the dielectric layer and the first semiconductor material. In another embodiment, a portion of the second semiconductor material is replaced with a third semiconductor material in order to impart uniaxial strain to the lattice structure of the second semiconductor material.

First claim

What is claimed is:

1. A semiconductor structure, comprising:
a substrate comprising crystalline silicon;
a region comprising germanium on a portion of the substrate comprising crystalline silicon, wherein the region comprising germanium is separate and distinct from the substrate comprising crystalline silicon;
a first gate dielectric layer directly on a portion of the region comprising germanium, the first dielectric layer comprising silicon and oxygen;
a second gate dielectric layer having a first portion on the first gate dielectric layer, the second gate dielectric layer separate and distinct from the first gate dielectric layer, and the second gate dielectric layer comprising hafnium and oxygen;
a gate electrode on the second gate dielectric layer, the gate electrode comprising a metal, and the gate electrode having a first sidewall and a second sidewall, wherein the second gate dielectric layer comprises a second portion along the first sidewall and a third portion along the second sidewall of the gate electrode;
a first dielectric spacer laterally adjacent the second portion of the second gate dielectric layer along the first sidewall of the gate electrode;
a second dielectric spacer laterally adjacent the third portion of the second gate dielectric layer along the second sidewall of the gate electrode;
a source region laterally adjacent the region comprising germanium at the first sidewall of the gate electrode; and
a drain region laterally adjacent the region comprising germanium at the second sidewall of the gate electrode.

2. The semiconductor structure of claim 1 , further comprising:
a first isolation region laterally adjacent the source region; and
a second isolation region laterally adjacent the drain region.

3. The semiconductor structure of claim 2 , wherein the first isolation region and the second isolation region extend to a depth in the substrate comprising crystalline silicon, the depth below a bottommost surface of the region comprising germanium.

4. The semiconductor structure of claim 1 , further comprising:
a first tip region in the region comprising germanium at the first side of the gate electrode; and
a second tip region in the region comprising germanium at the second side of the gate electrode.

5. The semiconductor structure of claim 1 , wherein the source region is a raised source region and the drain region is a raised drain region, and wherein an uppermost surface of the raised source region and the raised drain region is above an uppermost surface of the region comprising germanium.

6. The semiconductor device of claim 5 , wherein the source region and the drain region have a lattice constant different than a lattice constant of the region comprising germanium.

7. The semiconductor structure of claim 1 , wherein the portion of the substrate comprising crystalline silicon is a lower portion of a semiconductor fin extending from and continuous with a bulk portion of the substrate comprising crystalline silicon, and wherein the region comprising germanium is an upper portion of the semiconductor fin.

8. The semiconductor structure of claim 7 , wherein the gate electrode is over a top surface of the upper portion of the semiconductor fin and laterally adjacent to sidewalls of the upper portion of the semiconductor fin.

9. A semiconductor structure, comprising:
a substrate comprising crystalline silicon;
a region comprising a group III-V material on a portion of the substrate comprising crystalline silicon, wherein the region comprising the group III-V material is separate and distinct from the substrate comprising crystalline silicon;
a first gate dielectric layer directly on a portion of the region comprising the group III-V material, the first dielectric layer comprising silicon and oxygen;
a second gate dielectric layer having a first portion on the first gate dielectric layer, the second gate dielectric layer separate and distinct from the first gate dielectric layer, and the second gate dielectric layer comprising hafnium and oxygen;
a gate electrode on the second gate dielectric layer, the gate electrode comprising a metal, and the gate electrode having a first sidewall and a second sidewall, wherein the second gate dielectric layer comprises a second portion along the first sidewall and a third portion along the second sidewall of the gate electrode;
a first dielectric spacer laterally adjacent the second portion of the second gate dielectric layer along the first sidewall of the gate electrode;
a second dielectric spacer laterally adjacent the third portion of the second gate dielectric layer along the second sidewall of the gate electrode;
a source region laterally adjacent the region comprising the group III-V material at the first sidewall of the gate electrode; and
a drain region laterally adjacent the region comprising the group III-V material at the second sidewall of the gate electrode.

10. The semiconductor structure of claim 9 , further comprising:
a first isolation region laterally adjacent the source region; and
a second isolation region laterally adjacent the drain region.

11. The semiconductor structure of claim 10 , wherein the first isolation region and the second isolation region extend to a depth in the substrate comprising crystalline silicon, the depth below a bottommost surface of the region comprising the group III-V material.

12. The semiconductor structure of claim 9 , further comprising:
a first tip region in the region comprising the group III-V material at the first side of the gate electrode; and
a second tip region in the region comprising the group III-V material at the second side of the gate electrode.

13. The semiconductor structure of claim 9 , wherein the source region is a raised source region and the drain region is a raised drain region, and wherein an uppermost surface of the raised source region and the raised drain region is above an uppermost surface of the region comprising the group III-V material.

14. The semiconductor device of claim 13 , wherein the source region and the drain region have a lattice constant different than a lattice constant of the region comprising the group III-V material.

15. The semiconductor structure of claim 9 , wherein the portion of the substrate comprising crystalline silicon is a lower portion of a semiconductor fin extending from and continuous with a bulk portion of the substrate comprising crystalline silicon, and wherein the region comprising the group III-V material is an upper portion of the semiconductor fin.

16. The semiconductor structure of claim 15 , wherein the gate electrode is over a top surface of the upper portion of the semiconductor fin and laterally adjacent to sidewalls of the upper portion of the semiconductor fin.

Assignees

• Ranade Pushkar
• Intel Corp

Inventors

• Ranade Pushkar

Classifications

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10P95/064

  the removal being chemical etching · CPC title

• H10P14/69398

  the material having a perovskite structure, e.g. BaTiO3 · CPC title

• H10P14/69396

  the material containing at least one rare earth metal element, e.g. oxides of lanthanides, scandium or yttrium · CPC title

• H10P14/69395

  the material containing zirconium, e.g. ZrO2 · CPC title