Rapid Thermal Processing System With Cooling System
US-2024379390-A1 · Nov 14, 2024 · US
US9514969B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9514969-B2 |
| Application number | US-201414550781-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 21, 2014 |
| Priority date | Nov 26, 2013 |
| Publication date | Dec 6, 2016 |
| Grant date | Dec 6, 2016 |
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Embodiments of the present disclosure provide a cover assembly that includes a cover disposed between a device side surface of a substrate and a reflector plate, which are disposed within a thermal processing chamber. The presence of the cover between the device side surface of a substrate and a reflector plate has many advantages over conventional thermal processing chamber designs, which include an improved temperature uniformity during processing, a reduced chamber down time and an improved cost-of-ownership of the processes performed in the thermal processing chamber. In some configurations, the cover includes two or more ports that are formed therein and are positioned to deliver a gas, from a space formed between the reflector plate and the cover, to desired regions of the substrate during processing to reduce the temperature variation across the substrate.
Opening claim text (preview).
What is claimed is: 1. A thermal processing chamber, comprising: an energy source positioned to deliver energy towards a substrate support during processing; a reflector having a reflective surface, wherein the substrate support is disposed between the energy source and the reflector; a cover disposed between the reflector and the substrate support, wherein a cover volume region is formed between the cover and the reflective surface and the cover is at least partially opticall…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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