Process for production of replica mold for imprinting use

US9511514B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9511514-B2
Application numberUS-201113702873-A
CountryUS
Kind codeB2
Filing dateJun 21, 2011
Priority dateJun 23, 2010
Publication dateDec 6, 2016
Grant dateDec 6, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

The present invention provides a method for producing a replica mold for imprinting use which is inexpensive and has good properties including strength and flexibility. The method for producing a replica mold according to the present invention comprises the steps of: (A) coating a substrate with an organic-inorganic hybrid material; (B) semi-curing the coated surface with heat and/or an electromagnetic ray to produce a substrate for fine raised and depressed pattern formation; (C) pressing a master mold having a predetermined fine raised and depressed pattern formed thereon against the substrate for fine raised and depressed pattern formation by an imprinting method to transfer the fine raised and depressed pattern onto the substrate; and (D) irradiating the substrate for fine raised and depressed pattern formation onto which the fine raised and depressed pattern is transferred with an electromagnetic ray to cure the substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a replica mold comprising the steps of: (A) coating a surface of a substrate with an organic-inorganic hybrid material to form an organic-inorganic hybrid material layer; (B) semi-curing the organic-inorganic hybrid material layer with heat and/or an electromagnetic ray to produce a semi-cured organic-inorganic hybrid material layer; (C) pressing a master mold having a predetermined fine raised and depressed pattern formed thereon directly against an exposed surface of the semi-cured organic-inorganic hybrid material layer by an imprinting method to transfer the fine raised and depressed pattern onto the exposed surface of the semi-cured organic-inorganic hybrid material layer; and (D) irradiating the semi-cured organic-inorganic hybrid material layer onto which the fine raised and depressed pattern is transferred with an electromagnetic ray to cure the semi-cured organic-inorganic hybrid material layer, wherein the organic-inorganic hybrid material comprises: a) an organosilicon compound comprising: a compound represented by the formula (I): R 1 n SiX 4-n   (I) (wherein n represents 1 or 2; when n is 2, each R 1 is optionally the same or different; R 1 represents an organic group; and one or more of R 1 represent a vinyl group-containing hydrocarbon group; X represents a hydroxyl group or a hydrolyzable group; and each X is optionally the same or different), a compound represented by the formula (II): R 2 n SiX 4-n   (II) (wherein n represents 1 or 2; when n is 2, each R 2 is optionally the same or different; R 2 represents an organic group excluding a vinyl group-containing hydrocarbon group, which has a carbon atom bonded directly to Si in the formula; X represents a hydroxyl group or a hydrolyzable group; and each X is optionally the same or different), and a hydrolysis condensate thereof if present, wherein {[the compound of the formula (I)]+[a unit derived from the compound of the formula (I) in the hydrolysis condensate if present]}/{[the compound of the formula (I)]+[the compound of the formula (II)]+[a unit derived from the compound of the formula (I) in the hydrolysis condensate if present]+[a unit derived from the compound of the formula (II) in the hydrolysis condensate if present]}×100 is 30 to 100 mol %; and {[the compound of the formula (II)]+[a unit derived from the compound of the formula (II) in the hydrolysis condensate if present]}/{[the compound of the formula (I)]+[the compound of the formula (II)]+[a unit derived from the compound of the formula (I) in the hydrolysis condensate if present]+[a unit derived from the compound of the formula (II) in the hydrolysis condensate if present]}×100 is 0 to 70 mol %; b) an electromagnetic ray-curable compound; and c) a silanol condensation catalyst. 2. The method for producing a replica mold according to claim 1 , further comprising the step of (E) applying a mold releasing layer onto a surface of the fine raised and depressed pattern obtained in the step (D). 3. The method for producing a replica mold according to claim 1 , wherein the organic-inorganic hybrid material comprises a material for a mold releasing layer. 4. The method for producing a replica mold according to claim 1 , wherein {[the compound of the formula (I)]+[a unit derived from the compound of the formula (I) in the hydrolysis condensate if present]}/{[the compound of the formula (I)]+[the compound of the formula (II)]+[a unit derived from the compound of the formula (I) in the hydrolysis condensate if present]+[a unit derived from the compound of the formula (II) in the hydrolysis condensate if present]}×100 is 30 to 95 mol %; and {[the compound of the formula (II)]+[a unit derived from the compound of the formula (II) in the hydrolysis condensate if present]}/{[the compound of the formula (I)]+[the compound of the formula (II)]+[a unit derived from the compound of the formula (I) in the hydrolysis condensate if present]+[a unit derived from the compound of the formula (II) in the hydrolysis condensate if present]}×100 is 5 to 70 mol %. 5. The method for producing a replica mold according to claim 1 , wherein the electromagnetic ray-curable compound is 80 mass % or less based on the total mass of a solid content of the composition. 6. The method for producing a replica mold according to claim 1 , wherein the silanol condensation catalyst is a photosensitive compound. 7. A replica mold obtained by a method according to claim 1 . 8. The method for producing a replica mold according to claim 1 , wherein step (D) is a step of removing the master mold from the semi-cured organic-inorganic hybrid material layer, and then irradiating the semi-cured organic-inorganic hybrid material layer with an electromagnetic ray to cure the semi-cured organic-inorganic hybrid material layer.

Assignees

Inventors

Classifications

  • Microembossing · CPC title

  • using UV radiation · CPC title

  • Partially cured · CPC title

  • Heating or curing, e.g. crosslinking or vulcanizing {during moulding, e.g. in a mould}(cold vulcanisation B29C35/18 {; vulcanising tyres, presses therefor B29D30/0601}) · CPC title

  • characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor · CPC title

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What does patent US9511514B2 cover?
The present invention provides a method for producing a replica mold for imprinting use which is inexpensive and has good properties including strength and flexibility. The method for producing a replica mold according to the present invention comprises the steps of: (A) coating a substrate with an organic-inorganic hybrid material; (B) semi-curing the coated surface with heat and/or an electro…
Who is the assignee on this patent?
Kumazawa Kazuhisa, Shibata Hiromoto, Nippon Soda Co
What technology area does this patent fall under?
Primary CPC classification B29C33/3878. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 06 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).