Method for forming a non-deformable patterned template

Patent metadata

Field	Value
Publication number	US-9513543-B2
Application number	US-201314085042-A
Country	US
Kind code	B2
Filing date	Nov 20, 2013
Priority date	Nov 20, 2013
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

A method for forming a non-deformable patterned template includes providing a stable mesh, wherein the stable mesh is resistant to deformation; providing a curable liquid polymer; placing the stable mesh in the curable liquid polymer such that the stable mesh is completely enclosed within the liquid polymer; curing the liquid polymer to form a polymer sheet with the stable mesh embedded therein; and forming a surface pattern on at least one of the faces of the polymer sheet, the surface pattern including at least two fiducial marks.

First claim

The invention claimed is:

1. A method for forming a non-deformable patterned template, comprising:
providing a stable mesh, wherein the stable mesh is resistant to deformation;
providing a curable liquid polymer;
placing the stable mesh in the curable liquid polymer such that the stable mesh is completely enclosed within the liquid polymer;
curing the liquid polymer to form a polymer sheet with the stable mesh embedded therein;
forming a surface pattern on at least one of the faces of the polymer sheet, the surface pattern including at least two fiducial marks; and
aligning the stable mesh to the surface pattern by placing one or more fiducial marks on the stable mesh and aligning them to corresponding fiducial marks on the surface pattern.

2. The method of claim 1 , wherein providing the stable mesh causes the template to resist deformation when the temperature or water content of the template is changed in response to changes in the environment.

3. The method of claim 1 , wherein providing the stable mesh causes the template to resist deformation when tension is applied to the template.

4. The method of claim 1 , wherein providing the stable mesh causes the template to resist deformation when the temperature of the template is changed in response to applied radiation.

5. The method of claim 4 , wherein the radiation includes infra-red light, visible light, electromagnetic induction, or ultra-violet light.

6. The method of claim 1 , wherein providing the stable mesh causes the template to resist deformation when the temperature of the template is changed in response to applied heat.

7. The method of claim 6 , wherein the applied heat includes radiation, convective, conductive, or resistive heating.

8. The method of claim 1 , wherein the mesh is sufficiently transparent to actinic radiation.

9. The method of claim 1 , wherein the mesh is formed by producing a pattern of openings in a continuous sheet.

10. The method of claim 9 , wherein the mesh defines a plurality of anchor points corresponding to the portions of the continuous sheet remaining after the openings have been formed.

11. The method of claim 10 , wherein the anchor points limit the deformation of the polymer sheet to regions of the template corresponding to the openings of the mesh.

12. The method of claim 9 , wherein the pattern of openings is a cross-hatch, hexagonal, diamond-shaped, circular, or oval.

13. The method of claim 9 , wherein the structure of the pattern of openings causes the mesh to function as a flexure.

Assignees

• Eastman Kodak Co

Inventors

• Palone Thomas W

Classifications

• B29C33/3878

  used as masters for making successive impressions · CPC title

• B29C70/70

  Completely encapsulating inserts {(B29C70/86 takes precedence)} · CPC title

• B29C59/005

  characterised by the choice of material · CPC title

• B29C70/688

  the inserts being meshes or lattices (B29C70/82, B29C70/683 take precedence) · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title