Process equipment architecture

Patent metadata

Field	Value
Publication number	US-9508576-B2
Application number	US-201213486960-A
Country	US
Kind code	B2
Filing date	Jun 1, 2012
Priority date	Nov 7, 2008
Publication date	Nov 29, 2016
Grant date	Nov 29, 2016

Abstract

Embodiments of the present invention relate to improvements to single-substrate, multi-chamber processing platform architecture for minimizing fabrication facility floor space requirements. Prior art systems require significant floor space around all sides to allow for adequate installation and servicing. Embodiments of the present invention provide platforms that allow for servicing the chambers and supporting systems via a front and rear of the platform allowing multiple, side-by-side platform placement within a fabrication facility, while providing improved serviceability of the platform components.

First claim

The invention claimed is:

1. A system for substrate processing equipment, comprising:
a first single-substrate, multi-chamber processing platform having a first side and a second side with a central service corridor having a floor and a length extending the width of the platform from the first side of the first platform to the second side of the first platform and has a width of at least about 36 inches; and
a second single-substrate, multi-chamber processing platform having a first side and a second side with a central service corridor having a floor and a length extending the width of the platform from the first side of the second platform to the second side of the second platform and has a width of at least about 36 inches,
wherein the first and second platforms each have a rear service corridor having a length extending from a rear of the platform and intersecting the central service corridor, and
wherein the second side of the first platform is adjacent the first side of the second platform thereby eliminating a side access area disposed between the first and second platform, and the central service corridor of the first platform is substantially aligned with the central service corridor of the second platform thereby forming a continuous service corridor through the adjacent aligned first and second platforms.

2. The system of claim 1 , wherein the first and second platforms each have a first single-substrate processing chamber and a second single-substrate processing chamber adjacent the central service corridor and attached to a factory interface unit with an access panel separating the first and second processing chambers.

3. The system of claim 2 , wherein the first and second platforms each have a first power unit disposed adjacent the central service corridor opposite the first and second single-substrate processing chambers.

4. The system of claim 3 , wherein the first and second platforms each have a second power unit disposed adjacent the service corridor opposite the first and second single-substrate processing chambers.

5. The system of claim 4 , wherein the rear service corridor of each platform separates the first power unit from the second power unit.

6. The system of claim 5 , wherein the first power unit and the second power unit of each of the first and second platforms each have an access panel disposed adjacent the rear service corridor.

7. A system for substrate processing equipment, comprising:
a first substrate processing platform having a first side and a second side and a central service corridor having a floor and extending from the first side to the second side of the first platform;
a second substrate processing platform having a first side and a second side and a central service corridor having a floor and extending from the first side to the second side of the second platform, wherein the first side of the second platform is adjacent the second side of the first platform, thereby eliminating any access areas therebetween; and
a third substrate processing platform having a first side and a second side and a central service corridor having a floor and extending from the first side to the second side of the third platform, wherein the second side of the second platform is adjacent the first side of the third platform, thereby eliminating any access areas therebetween, and wherein the central service corridor of each of the platforms are substantially aligned thereby forming a continuous service corridor through the adjacent aligned first, second and third platforms,
wherein the first, second and third platforms each have a rear service corridor having a length extending from a rear of the platform and intersecting the central service corridor.

8. The system of claim 7 , wherein the first, second and third platforms each have a first single-substrate processing chamber and a second single-substrate processing chamber adjacent the central service corridor and attached to a factory interface unit with an access panel separating the first and second single-substrate processing chambers.

9. The system of claim 8 , wherein each of the first, second and third platforms have a first and second power unit disposed adjacent the service corridor opposite the first and second single-substrate processing chambers.

10. The system of claim 9 , wherein the rear service corridor of each platform separates the first power unit from the second power unit.

11. The system of claim 10 , wherein the rear service corridor has a width of at least about 42 inches.

12. The system of claim 5 , wherein the rear service corridor has a width of at least about 42 inches.

Assignees

• Newman Jacob
• Kanawade Dinesh
• Schwartz Miriam
• Merry Nir
• Haag Michael Thomas
• Applied Materials Inc

Inventors

• Newman Jacob
• Kanawade Dinesh
• Schwartz Miriam
• Merry Nir
• Haag Michael Thomas

Classifications

• H10P72/0462 Primary

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H01L21/6719 Primary

  Electricity · mapped topic