Vacuum system for immersion photolithography

Patent metadata

Field	Value
Publication number	US-9507270-B2
Application number	US-201414469389-A
Country	US
Kind code	B2
Filing date	Aug 26, 2014
Priority date	Jun 16, 2004
Publication date	Nov 29, 2016
Grant date	Nov 29, 2016

Abstract

A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.

First claim

The invention claimed is:

1. A lithographic apparatus, comprising:
a projection device configured to project a radiation beam onto a substrate; and
a system to extract multi-phase fluid from a part of the lithographic apparatus system, the system comprising:
a pump system configured to draw the fluid from the part,
a separator configured to separate the fluid drawn from the part into gas and liquid phases, and
a control system configured to control the pressure within the separator by regulating the gas and/or liquid therein.

2. The apparatus according to claim 1 , further comprising a gas supply configured to supply gas to the separator from a source thereof, and the control system is configured to control flow of the gas to the separator.

3. The apparatus according to claim 1 , wherein the control system is configured to control flow of gas from the separator.

4. The apparatus according to claim 1 , further comprising a liquid supply configured to supply liquid to the separator from a source thereof, and the control system is configured to control flow of liquid to the separator.

5. The apparatus according to claim 1 , wherein the control system is configured to control the amount of liquid within the separator.

6. The apparatus according to claim 1 , wherein the separator comprises an extraction tank.

7. The apparatus according to claim 1 , further comprising an outlet configured to remove a multi-phase fluid from a space between the projection device and the substrate.

8. The apparatus according to claim 1 , further comprising an inlet configured to supply liquid to a space between the projection device and a surface facing the projection device, wherein the pump system is configured to remove the multi-phase fluid from the space between the projection device and the surface facing the projection device.

9. A method of extracting a stream of multi-phase fluid from a part of a photolithography tool, the method comprising:
operating a pumping arrangement to draw the fluid from the part of the tool;
separating the fluid drawn from the part of the tool into gas and liquid phases within a separator chamber; and
controlling the pressure within the separator chamber by regulating the gas and/or liquid therewithin.

10. The method according to claim 9 , wherein the pressure within the separator chamber is controlled by regulating a supply of gas from a source thereof to the separator chamber.

11. The method according to claim 9 , wherein the pressure within the separator chamber is controlled by regulating the flow of gas from the separator chamber.

12. The method according to claim 9 , wherein the pressure within the separator chamber is controlled by regulating a supply of liquid to the separator chamber from a source thereof.

13. The method according to claim 9 , wherein the pressure within the separator chamber is controlled by controlling an amount of liquid within the separator chamber.

14. The method according to claim 9 , further comprising supplying liquid to a space between the projection device of the tool and a surface facing the projection device, and wherein the multi-phase fluid is drawn from the space between the projection device and the surface facing the projection device.

15. A lithography apparatus, comprising:
a projection device configured to project a radiation beam onto a substrate;
an outlet configured to remove a mixture of liquid and gas; and
an evacuation extraction system configured to draw the mixture through the outlet, the evacuation extraction system comprising a separator chamber arranged to separate liquid from gas in the removed mixture and a control system configured to maintain a substantially stable pressure within the separator chamber.

16. The apparatus according to claim 15 , wherein the control system is configured to control flow of gas from the separator chamber to regulate the pressure within the separator chamber.

17. The apparatus according to claim 15 , wherein the control system is configured to control the amount of liquid within the separator to regulate the pressure within the separator chamber.

18. The apparatus according to claim 15 , further comprising an inlet configured to supply liquid to a space between the projection device and a surface facing the projection device, wherein the outlet is configured to remove the multi-phase fluid from the space between the projection device and the surface facing the projection device.

19. The apparatus according to claim 15 , further comprising a flow restriction in the fluid path between the separator chamber and a pump fluidly connected to the separator chamber.

20. The apparatus according to claim 15 , further comprising a sensor configured to measure the liquid in the separator chamber.

21. The apparatus according to claim 15 , wherein the separator chamber further comprises an outlet for liquid and further comprising a pump fluidly connected to the outlet, the pump configured to extract liquid through the outlet.

Assignees

• Asml Netherlands Bv

Inventors

• Harpham Andrew John
• Shechter Paul John
• Stockman Paul Alan

Classifications

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/70841

  Constructional issues related to vacuum environment, e.g. load-lock chamber · CPC title

• B01D57/00

  Separation, other than separation of solids, not fully covered by a single other group or subclass, e.g. B03C · CPC title

• G03F7/70858 Primary

  Environment aspects, e.g. pressure of beam-path gas, temperature (pollution aspects G03F7/70916) · CPC title

• G03F7/20 Primary

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title