Photomask including transfer patterns for reducing a thermal stress
US-9846358-B2 · Dec 19, 2017 · US
Photomask and pattern forming method using photomask
US9507252B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9507252-B2 |
| Application number | US-201514798542-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 14, 2015 |
| Priority date | Jan 21, 2013 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
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Abstract
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A photomask includes a transparent substrate, and a light shield provided to the transparent substrate. The light shield includes a translucent mask pattern opening, and the mask pattern opening includes a plurality of translucent regions which are provided to a periphery of a region corresponding to a desired pattern, and allow exposure light beams to be transmitted at at least three different phases. Each of the plurality of translucent region spaced apart from the region corresponding to the desired pattern, advances more toward an exposure object spaced a predetermined distance apart compared to a phase plane of an exposure light beam transmitted through a translucent region of the plurality of translucent regions, the translucent region close to the region corresponding to the desired pattern, such that the exposure light beams that are transmitted through the mask pattern opening form a projection image of the desired pattern on the exposure object.
First claim
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What is claimed is: 1. A photomask comprising: a transparent substrate; and a light shield provided to the transparent substrate and shielding an exposure light beam, wherein the light shield includes a translucent mask pattern opening, the mask pattern opening includes a plurality of translucent regions which are provided to a periphery of a region corresponding to a desired pattern, and allow exposure light beams to be transmitted through at least three different phases, a…
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Frequently asked questions
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- What does patent US9507252B2 cover?
- A photomask includes a transparent substrate, and a light shield provided to the transparent substrate. The light shield includes a translucent mask pattern opening, and the mask pattern opening includes a plurality of translucent regions which are provided to a periphery of a region corresponding to a desired pattern, and allow exposure light beams to be transmitted at at least three different…
- Who is the assignee on this patent?
- Panasonic Ip Man Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F1/28. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).