Pan pitch control in a longwall shearing system

US9506343B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9506343-B2
Application numberUS-201414472330-A
CountryUS
Kind codeB2
Filing dateAug 28, 2014
Priority dateAug 28, 2014
Publication dateNov 29, 2016
Grant dateNov 29, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A system and corresponding method of monitoring a longwall shearing mining machine in a longwall mining system, where the shearing mining machine includes a shearer having a cutter drum, the method includes obtaining, by a processor, desired pitch angle information, and receiving, by the processor, a pitch angle indicative of a current pitch position of the shearer. The method also includes determining, by the processor, whether the pitch angle is within a desired pitch angle range, and controlling, by the processor, a position of the cutter drum based on whether the pitch angle is within the desired pitch angle range. The desired pitch angle range is based on the desired pitch angle information.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of monitoring a longwall shearing mining machine in a longwall mining system, the shearing mining machine including a shearer having a cutter drum, the method comprising: obtaining, by a processor, desired pitch angle information for the shearer; receiving, by the processor, a pitch angle indicative of a current pitch position of the shearer; determining, by the processor, whether the pitch angle is within a desired pitch angle range, the desired pitch angle range based on the desired pitch angle information, the desired pitch angle range including a high pitch angle threshold and a low pitch angle threshold; and controlling, by the processor, a position of the cutter drum based on whether the pitch angle is within the desired pitch angle range; wherein controlling the position of the cutter drum includes changing a vertical position of the cutter drum based on a difference between the pitch angle and at least one selected from a group consisting of the high pitch angle threshold and the low pitch angle threshold. 2. The method of claim 1 , wherein the desired pitch angle information includes at least one selected from a group consisting of a desired pitch angle and a desired pitch angle tolerance. 3. The method of claim 1 , wherein controlling the vertical position of the cutter drum includes at least one selected from a group consisting of lowering the position of the cutter drum when the pitch angle exceeds the high pitch angle threshold and raising the position of the cutter drum when the pitch angle is below the low pitch angle threshold. 4. The method of claim 1 , wherein determining whether the pitch angle is within the desired pitch angle range includes comparing, by the processor, the pitch angle to at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold. 5. The method of claim 1 , further comprising calculating, by the processor, a pitch correction height based on a difference between the pitch angle and the at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold, and wherein controlling the position of the cutter drum includes at least one selected from the group consisting of lowering and raising the cutter drum based on the pitch correction height. 6. The method of claim 1 , wherein obtaining desired pitch angle information includes receiving, by the processor, a desired pitch angle, and calculating, by the processor, at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold using the desired pitch angle and a desired pitch angle tolerance, wherein the desired pitch angle range is defined by the at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold. 7. The method of claim 1 , wherein obtaining desired pitch angle information includes receiving, by the processor, at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold, wherein the desired pitch angle range is defined by the at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold, and wherein determining whether the pitch angle is within a desired pitch angle range includes comparing, by the processor, the pitch angle to the at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold. 8. The method of claim 1 , wherein the cutter drum is a floor cutter drum used to cut a lower section of a mineral seam, and wherein the shearer further includes a roof cutter drum used to cut an upper section of the mineral seam. 9. A monitoring device for a longwall mining system including a shearer having a cutter drum and a sensor to determine a pitch position of the shearer, the monitoring device including: a monitoring module implemented on a processor in communication with the shearer to obtain desired pitch angle information and receive a pitch angle indicative of a current pitch position of the shearer, the monitoring module including: an analysis module configured to determine whether the pitch angle is within a desired pitch angle range, the pitch angle range based on the desired pitch angle information, the pitch angle range including a high pitch angle threshold and a low pitch angle threshold; and a correction module configured to control a position of the cutter drum based on whether the pitch angle is within the desired pitch angle range wherein the correction module is configured to change a vertical position of the cutter drum based on a difference between the pitch angle and at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold. 10. The monitoring device of claim 9 , wherein the desired pitch angle information includes at least one selected from a group consisting of a desired pitch angle and a desired pitch angle tolerance. 11. The monitoring device of claim 9 , wherein the correction module is configured to lower the position of the cutter drum when the pitch angle exceeds the high pitch angle threshold and raise the position of the cutter drum when the pitch angle is below the low pitch angle threshold. 12. The monitoring device of claim 9 , wherein the analysis module is configured to calculate a pitch correction height based on a difference between the pitch angle and the at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold, and wherein the correction module is configured to perform at least one selected from a group consisting of lowering and raising the cutter drum based on the pitch correction height. 13. The monitoring device of claim 9 , wherein the analysis module is configured to compare the pitch angle to at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold to determine whether the pitch angle is within the desired pitch angle range. 14. The monitoring device of claim 9 , wherein the monitoring module is configured to receive a desired pitch angle; calculate at least one selected from the group consisting of the high pitch angle threshold and the low pitch threshold using the desired pitch angle and a desired pitch angle tolerance, wherein the desired pitch angle range is defined by the at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold. 15. The monitoring device of claim 9 , wherein the monitoring module is configured to receive at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold, wherein the desired pitch angle range is defined by the at least of the high pitch angle threshold and the low pitch angle threshold, and wherein the analysis module compares the pitch angle to the at least one selected from the group consisting of the high pitch angle threshold and the low pitch angle threshold to determine whether the pitch angle is within the desired pitch angle range. 16. The monitoring device of claim 9 , wherein the cutter drum is a floor cutter drum used to cut a lower section of a mineral seam, and wherein the shearer further includes a roof cutter drum used to cut an upper section of the mineral seam. 17. A longwall mining system comprising: a shearer including a shearer body, a cutter drum coupled to the shearer body, a sensor coupled to the shearer body

Assignees

Inventors

Classifications

  • Tunnels or galleries, with or without linings; Methods or apparatus for making thereof (E02D29/045, E02D29/063 take precedence; linings per se E21D11/00); Layout of tunnels or galleries · CPC title

  • Protection against overload during transfer of machines for slitting or completely freeing the mineral from the seam · CPC title

  • by rotary drills with breaking-down means, e.g. wedge-shaped drills {, i.e. the rotary axis of the tool carrier being substantially perpendicular to the working face, e.g. MARIETTA-type (similar machines for tunneling E21D9/102)} · CPC title

  • by adjustable or non-adjustable planing means with or without loading arrangements (by percussed planing means E21C27/46) · CPC title

  • E21C35/08Primary

    Guiding the machine · CPC title

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What does patent US9506343B2 cover?
A system and corresponding method of monitoring a longwall shearing mining machine in a longwall mining system, where the shearing mining machine includes a shearer having a cutter drum, the method includes obtaining, by a processor, desired pitch angle information, and receiving, by the processor, a pitch angle indicative of a current pitch position of the shearer. The method also includes det…
Who is the assignee on this patent?
Joy Mm Delaware Inc
What technology area does this patent fall under?
Primary CPC classification E21C35/08. Mapped technology areas include Fixed Constructions.
When was this patent published?
Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).