Substrate processing apparatus
US-2024021419-A1 · Jan 18, 2024 · US
Method and hardware for cleaning UV chambers
US9506145B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9506145-B2 |
| Application number | US-201615180514-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 13, 2016 |
| Priority date | Aug 23, 2012 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
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Abstract
Official abstract text for this publication.
A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NF 3 and O 2 to remove silicon residues. The UV chamber may have two UV transparent showerheads, which together with a UV window in the chamber lid, define a gas volume proximate the UV window and a distribution volume below the gas volume. A purge gas may be flowed through the gas volume while one or more of the cleaning gases is flowed into the distribution volume to prevent the cleaning gases from impinging on the UV transparent window.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method of cleaning a process chamber having an interior space, comprising: providing a purge gas to a first portion of the interior space; providing a first cleaning gas to a second portion of the interior space, wherein the first portion of the interior space is separated from the second portion of the interior space by a first UV transparent showerhead; activating the first cleaning gas using ultraviolet (UV) radiation from UV lamps positioned…
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Classifications
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
- C23C16/4405Primary
Chemistry & Metallurgy · mapped topic
- B08B7/0021Primary
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US9506145B2 cover?
- A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NF 3 and O 2 to remove silicon residues. The UV chamber may have two UV transparent showerhe…
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification C23C16/4405. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).