Transparent ABS resin composition having superior shock resistance, scratch resistance, and transparency

US9505923B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9505923-B2
Application numberUS-201214369030-A
CountryUS
Kind codeB2
Filing dateDec 11, 2012
Priority dateDec 30, 2011
Publication dateNov 29, 2016
Grant dateNov 29, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A transparent ABS resin composition of the present invention comprises: an acrylonitrile-butadiene-styrene graft (g-ABS) copolymer which is copolymerized by mixture of acrylate based monomer, styrene based monomer, and acrylonitrile based monomer (a2) on butadiene based rubber polymer (a1); and (B) a styrene-acrylonitrile based copolymer, satisfies a relation denoted by Equation 1 and Equation 2 below, and has excellent impact resistance, scratch resistance, and transparency: 0≦| X−Y |≦0.005  (Equation 1) 0≦| X−Z |≦0.005  (Equation 2) In the Equations, X is refractive index of the acrylonitrile-butadiene-styrene graft (g-ABS) copolymer, Y is refractive index of the butadiene based rubber polymer (a1), and Z is refractive index of the styrene-acrylonitrile based copolymer (B).

First claim

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That which is claimed is: 1. A transparent ABS resin composition comprising: (A) an acrylonitrile-butadiene-styrene graft (g-ABS) copolymer in which a monomer mixture of acrylate based monomer, styrene based monomer, and acrylonitrile based monomer (a2) is copolymerized onto a butadiene based rubber polymer (a1); and (B) a styrene-acrylonitrile based copolymer, wherein the transparent ABS resin composition satisfies the following Equation 1 and Equation 2: 0≦| X−Y|≦ 0.005  (Equation 1) 0≦| X−Z|≦ 0.005  (Equation 2) wherein the X is refractive index of the acrylonitrile-butadiene-styrene graft (g-ABS) copolymer (A), the Y is refractive index of the butadiene based rubber polymer (a1), and the Z is refractive index of the styrene-acrylonitrile based copolymer (B), and wherein the transparent ABS resin composition has a haze value of less than 1.0% and un-notched IZOD impact strength (¼″) of about 30 kgf·cm/cm or more. 2. The transparent ABS resin composition of claim 1 , wherein the transparent ABS resin composition comprises about 5 to about 75% by weight of the g-ABS copolymer (A), and about 25 to about 95% by weight of the styrene-acrylonitrile based copolymer (B). 3. The transparent ABS resin composition of claim 1 , wherein the monomer mixture of the acrylate based monomer, the styrene based monomer, and the acrylonitrile based monomer (a2) is copolymerized onto the butadiene based rubber polymer (a1) in a graft ratio of about 55 to about 80%. 4. The transparent ABS resin composition of claim 1 , wherein the g-ABS copolymer (A) comprises about 40 to about 60% by weight of the butadiene based rubber polymer (a1), and about 40 to about 60% by weight of the monomer mixture (a2). 5. The transparent ABS resin composition of claim 1 , wherein the monomer mixture (a2) comprises about 40 to about 80% by weight of the acrylate based monomer, about 10 to about 40% by weight of the styrene based monomer, and about 1 to about 20% by weight of the acrylonitrile based monomer. 6. The transparent ABS resin composition of claim 1 , wherein the styrene-acrylonitrile based copolymer (B) comprises about 40 to about 80% by weight of acrylate based monomer, about 10 to about 40% by weight of styrene based monomer, and about 1 to about 20% by weight of acrylonitrile based monomer. 7. The transparent ABS resin composition of claim 1 , wherein the butadiene based rubber polymer (a1) is polybutadiene, styrene-butadiene copolymer, or a combination thereof. 8. The transparent ABS resin composition of claim 1 , wherein the butadiene based rubber polymer (a1) has an average particle diameter of about 0.07 to about 0.15 μm, a gel content of about 60 to about 95% by weight, and a swelling index of about 10 to about 30. 9. The transparent ABS resin composition of claim 1 , wherein the acrylate based monomer is C 2 to C 20 (meth)acrylic acid alkyl ester. 10. The transparent ABS resin composition of claim 1 , wherein the styrene based monomer is selected from the group consisting of styrene, α-ethyl styrene, α-methyl styrene, p-methyl styrene, o-t-butyl styrene, bromo styrene, chloro styrene, trichloro styrene, and combinations thereof. 11. The transparent ABS resin composition of claim 1 , wherein the acrylonitrile based monomer is acrylonitrile, methacrylonitrile, fumaronitrile, or a combination thereof. 12. The transparent ABS resin composition of claim 1 , wherein the transparent ABS resin composition has a weight average molecular weight of about 30,000 to about 100,000 g/mol. 13. The transparent ABS resin composition of claim 1 , wherein the transparent ABS resin composition comprises one or more additives selected from the group consisting of thermal stabilizers, releasing agents, dispersing agents, anti-dripping agents, weather resistant agents, inorganic fillers, and inorganic fibers. 14. The transparent ABS resin composition of claim 1 , wherein the transparent ABS resin composition has a pencil hardness of H to 2H.

Assignees

Inventors

Classifications

  • with unsaturated nitriles · CPC title

  • C08F279/02Primary

    on to polymers of conjugated dienes · CPC title

  • C08L33/20Primary

    Homopolymers or copolymers of acrylonitrile (C08L55/02 takes precedence) · CPC title

  • C08L55/02Primary

    ABS [Acrylonitrile-Butadiene-Styrene] polymers · CPC title

  • grafted on to rubbers · CPC title

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What does patent US9505923B2 cover?
A transparent ABS resin composition of the present invention comprises: an acrylonitrile-butadiene-styrene graft (g-ABS) copolymer which is copolymerized by mixture of acrylate based monomer, styrene based monomer, and acrylonitrile based monomer (a2) on butadiene based rubber polymer (a1); and (B) a styrene-acrylonitrile based copolymer, satisfies a relation denoted by Equation 1 and Equation …
Who is the assignee on this patent?
Cheil Ind Inc, Samsung Sdi Co Ltd
What technology area does this patent fall under?
Primary CPC classification C08F279/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).