Pattern irradiation apparatus having spatial light modulator and light blocking member for blocking 0-order light generated by spatial light modulator

Patent metadata

Field	Value
Publication number	US-9500848-B2
Application number	US-201414228030-A
Country	US
Kind code	B2
Filing date	Mar 27, 2014
Priority date	Apr 4, 2013
Publication date	Nov 22, 2016
Grant date	Nov 22, 2016

Abstract

A pattern irradiation apparatus includes a light source unit, an objective, a spatial light modulator, a light blocking member, and a control device. The objective irradiates a sample plane with light emitted from the light source unit. The spatial light modulator is of a phase modulation type and is arranged at a position conjugate with a pupil position of the objective and modulates a phase of the light emitted from the light source unit. The light blocking member is arranged in an optical path between the spatial light modulator and the objective and is configured to block 0-order light generated by the spatial light modulator. The control device makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member.

First claim

What is claimed is:

1. A pattern irradiation apparatus comprising:
a light source unit;
an objective that irradiates a sample plane with light emitted from the light source unit;
a spatial light modulator of a phase modulation type that is arranged at a position conjugate with a pupil position of the objective and that modulates a phase of the light emitted from the light source unit;
a light blocking member that is arranged in an optical path between the spatial light modulator and the objective and that is configured to block 0-order light generated by the special light modulator; and
a control device that makes a correspondence between a focusing position of the 0-order light generator by the spatial light modulator and a position of the light blocking member,
wherein the control device controls a phase modulation pattern of the spatial light modulator so that a correspondence is made between the focusing position of the 0-order light generated by the spatial light modulator and the position of the light blocking member.

2. The pattern irradiation apparatus according to claim 1 , wherein the control device controls the phase modulation pattern of the spatial light modulator so that the phase modulation pattern becomes a phase modulation pattern that is a result of adding a phase modulation pattern calculated from an irradiation pattern to be formed on the sample plane and a phase modulation pattern for moving the focusing position of the 0-order light generated by the spatial light modulator.

3. The pattern irradiation apparatus according to claim 1 , wherein:
the light source unit includes a lens system for changing a flux diameter of the light emitted from the light source unit; and
the control device controls the lens system so that light having a flux diameter in accordance with a pupil diameter of the objective is emitted from the light source unit.

4. The pattern irradiation apparatus according to claim 1 , wherein the light source unit includes a wavelength-variable laser.

5. The pattern irradiation apparatus according to claim 1 , wherein the light source unit includes:
a plurality of light sources; and
an optical path switching member for guiding, to the spatial light modulator, light that is from a light source selected from among the plurality of light sources and that is emitted from the light source unit.

6. The pattern irradiation apparatus according to claim 1 , further comprising:
an insertion-removal mechanism that inserts and removes the light blocking member with respect to an optical path between the spatial light modulator and the objective; and
an optical detector that detects light from the sample plane.

7. The pattern irradiation apparatus according to claim 1 , wherein the pattern irradiation apparatus is a microscope apparatus.

8. The pattern irradiation apparatus according to claim 1 , wherein the control device controls the light source unit so that at least one of a wavelength, a wavefront, and a flux diameter of the light emitted from the light source unit changes.

9. The pattern irradiation apparatus according to claim 1 , further comprising a position adjustment mechanism that moves a position of the light blocking member,
wherein the control device controls the position adjustment mechanism so that a correspondence is made between the focusing position of the 0-order light generated by the spatial light modulator and the position of the light blocking member.

10. A pattern irradiation apparatus comprising:
a light source unit;
an objective that irradiates a sample plane with light emitted from the light source unit;
a spatial light modulator of a phase modulation type that is arranged at a position conjugate with a pupil position of the objective and that modulates a phase of the light emitted from the light source unit;
a light blocking member that is arranged in an optical path between the spatial light modulator and the objective and that is configured to block 0-oder light generated by the spatial light modulator;
a control device that makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member; and
a storage unit that stores, beforehand, information for making a correspondence between the focusing position of the 0-order light generated by the spatial light modulator and the position of the light blocking member for each state of the light source unit in which at least one of a wavelength, a wavefront, and a flux diameter of the light emitted from the light source unit is different,
wherein the control device reads, from the storage unit, information in accordance with the state of the light source unit, and makes a correspondence between the focusing position of the 0-order light generated by the spatial light modulator and the position of the light blocking member based on the read information.

11. A pattern irradiation apparatus comprising:
a light source unit;
an objective that irradiates a sample plane with light emitted from the light source unit;
a spatial light modulator of a phase modulation type that is arranged at a position conjugate with a pupil position of the objective and that modulates a phase of the light emitted from the light source unit;
a light blocking member that is arranged in an optical path between the spatial light modulator and the objective and that is configured to block 0-order light generated by the spatial light modulator;
a control device that makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member;
an insertion-removal mechanism that inserts and removes the light blocking member with respect to the optical path between the spatial light modulator and the objective; and
an optical detector that detects light from the sample plane,
wherein the control device compares a light amount detected by the optical detector with the light blocking member having been inserted by the insertion-removal mechanism and a light amount detected by the optical detector with the light blocking member having been removed by the insertion-removal mechanism, and thereby makes a correspondence between the focusing position of the 0-order light generated by the spatial light modulator and the position of the light blocking member based on a comparison result.

12. A pattern irradiation apparatus comprising:
a light source unit;
an objective that irradiates a sample plane with light emitted from the light source unit;
a spatial light modulator of a phase modulation type that is arranged at a position conjugate with a pupil position of the objective and that modulates a phase of the light emitted from the light source unit;
a light blocking member that is arranged in an optical path between the spatial light modulator and the objective and that is configured to block 0-order light generated by the spatial light modulator;
a control device that makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member; and
a position adjustment mechanism that moves a position of the light blocking member,
wherein the control device controls the position adjustment mechanism so that a correspondence is made between the focusing position of the 0-order light generated by the spatial light modulator and the position of the light blocking member, and
wherein the position adjustment mechanism moves the light blocking member in an optical axis direction so as to make the focusing position of the 0-order light generated b

Assignees

• Olympus Corp

Inventors

• Fujii Shintaro

Classifications

• G02B26/06 Primary

  for controlling the phase of light (G02B26/08 takes precedence {, measuring optical phase difference G01J9/00}) · CPC title

• G02B21/14 Primary

  affording illumination for phase-contrast observation · CPC title

• G02B27/46

  Systems using spatial filters · CPC title

• G02B21/08 Primary

  Condensers · CPC title

• G02B21/02

  Objectives · CPC title