Thermo-mechanical actuator
US-12117739-B2 · Oct 15, 2024 · US
Optical system and multi facet mirror of a microlithographic projection exposure apparatus
US9213245B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9213245-B2 |
| Application number | US-201213715000-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 14, 2012 |
| Priority date | Jul 1, 2010 |
| Publication date | Dec 15, 2015 |
| Grant date | Dec 15, 2015 |
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Abstract
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An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation and/or position, but not the shape, of at least two mirror facets. In this way aberrations can be corrected.
First claim
Opening claim text (preview).
What is claimed is: 1. An optical system, comprising: a multi facet mirror comprising: a support plate; a plurality of mirror facets, each mirror facet comprising a mirror substrate and a reflective coating supported by the mirror substrate, and each mirror facet being attached to the support plate; and at least one actuator configured to deform the support plate, wherein: during use of the optical system, each deformation caused by the at least one actuator changes a re…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- G03F7/70266Primary
Physics · mapped topic
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- What does patent US9213245B2 cover?
- An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation an…
- Who is the assignee on this patent?
- Zeiss Carl Smt Gmbh
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70266. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Dec 15 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).