Method of measuring temperature of component in processing chamber of substrate processing apparatus
US-9028139-B2 · May 12, 2015 · US
US9500537B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9500537-B2 |
| Application number | US-201615073273-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 17, 2016 |
| Priority date | Mar 10, 2008 |
| Publication date | Nov 22, 2016 |
| Grant date | Nov 22, 2016 |
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A temperature measurement apparatus includes a light source; a first splitter that splits a light beam into a measurement beam and a reference beam; a reference beam reflector that reflects the reference beam; an optical path length adjustor; a second splitter that splits the reflected reference beam into a first reflected reference beam and a second reflected reference beam; a first photodetector that measures an interference between the first reflected reference beam and a reflected measurement beam obtained by the measurement beam reflected from a target object; a second photodetector that measures an intensity of the second reflected reference beam; and a temperature calculation unit. The temperature calculation unit calculates a location of the interference by subtracting an output signal of the second photodetector from an output signal of the first photodetector, and calculates a temperature of the target object from the calculated location of the interference.
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What is claimed is: 1. A temperature measurement apparatus, comprising: a light source; a splitter that splits a light beam emanated from the light source into a measurement beam and a reference beam; a reference beam reflector that reflects the reference beam; an optical path length adjustor that adjusts an optical path length of the reference beam reflected from the reference beam reflector; a photodetector that measures an interference between the reflected reference be…
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