Gas Sensor Device
US-2016202200-A1 · Jul 14, 2016 · US
US9494543B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9494543-B2 |
| Application number | US-201213620546-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 14, 2012 |
| Priority date | Sep 28, 2011 |
| Publication date | Nov 15, 2016 |
| Grant date | Nov 15, 2016 |
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Disclosed is an electrochemical gas sensor using micro electro mechanical systems (MEMS). The MEMS electrochemical gas sensor includes: a substrate a lower central region of which is etched by a predetermined thickness; a first insulation film formed on the substrate; a heat emitting resistance body formed on the first insulation film; a second insulation film formed on the heat emitting resistance body; a reference electrode formed in an upper central region of the second insulation film; a solid electrolyte formed on the reference electrode; and a detection electrode formed on the solid electrolyte.
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What is claimed is: 1. A MEMS electrochemical gas sensor, comprising: a substrate; a first insulation film disposed over the substrate; a heat emitting resistance body disposed over the first insulation film; a second insulation film disposed over the heat emitting resistance body; a reference electrode disposed over a central region of the second insulation film; a solid electrolyte disposed over the reference electrode; and a detection electrode disposed over the solid electrolyte, wherein the second insulation film exposes a portion of the heat emitting resistance body for coupling the heat emitting resistance body to an external circuit through the exposed portion, and wherein an upper central region of the substrate under the reference electrode and the detection electrode is etched by a predetermined thickness to thermally isolate the reference electrode, the detection electrode, and a portion of the heat emitting resistance body under the reference electrode from the substrate. 2. The MEMS electrochemical gas sensor of claim 1 , wherein the substrate is a silicon substrate or a substrate doped with any one of aluminum oxide (Al2O3), magnesium oxide (MgO), quartz, gallium-nitrogen (GaN) and gallium-arsenic (GaAs). 3. The MEMS electrochemical gas sensor of claim 1 , wherein the first insulation film and the second insulation film include a single or plurality of silicon oxide films or silicon nitride films. 4. The MEMS electrochemical gas sensor of claim 1 , wherein the heat emitting resistance body includes a metal including at least one of platinum (Pt), palladium (Pd), iridium (Ir), tungsten (W), gold (Au), silicon and a conductive metal oxide. 5. The MEMS electrochemical gas sensor of claim 1 , further comprising: an attachment layer disposed between the first insulation film and the heat emitting resistance body and containing chrome (Cr) or titanium (Ti). 6. The MEMS electrochemical gas sensor of claim 1 , wherein the reference electrode includes a metal including at least one of platinum (Pt), palladium (Pd), iridium (Ir), tungsten (W), gold (Au) and an oxide material including at least one of Ag2SO4, Na2Ti6O13-TiO2, Li2TiO3-TiO2, LiMn2O4, LiCoO2-Co3O4 and Na2ZrO3-ZrO3. 7. The MEMS electrochemical gas sensor of claim 1 , wherein the solid electrolyte includes at least one of yttria stabilized zirconia (YSZ), K2CO3, NASICON(Na1+xZr2SixP3-xO12), β-Al2O3(Na 2 O.11Al2O3), Li3PO4, LISICON(Li2+2xZn1-xGeO4), lithium phosphorous oxynitride (LIPON), Li2CO3-MgO, Li2SO4, Li4SiO4, Li14ZnGe4O16, γ-Li3.6Ge0.6V0.4O4, Li3N, Li-β-alumina, Li1+xTi2-xMx(PO4)3(M=Al, Sc, Y or La), LGPS(Li2GeP2S12) and LixLa(2−x)/3TiO3. 8. The MEMS electrochemical gas sensor of claim 1 , wherein the detection electrode includes a metal including at least one of platinum (Pt), palladium (Pd), iridium (Ir), tungsten (W), gold (Au) and an oxide material including at least one of Na2CO3, mixed Na2CO3(Na2CO3-BaCO3, Na2CO3-Li2CO3, Li2CO3-BaCO3 and Li2CO3-CaCO3), Li2CO3 and mixed Li2CO3(Li2CO3-BaCO3, Li2CO3-SrCO3 and Li2CO3-CaCO3). 9. The MEMS electrochemical gas sensor of claim 1 , wherein the reference electrode and the detection electrode have an interdigital shape, a hollow box shape, a box shape, or a combination thereof. 10. A MEMS electrochemical gas sensor, comprising: a substrate; a first insulation film disposed over the substrate; a heat emitting resistance body disposed over the first insulation film; a second insulation film disposed over the heat emitting resistance body; a solid electrolyte disposed over a central region of the second insulation film; a reference electrode disposed at a first side of an upper portion of the solid electrolyte; and a detection electrode disposed at a second side of the upper portion of the solid electrolyte opposite to the first side, wherein the second insulation film exposes a portion of the heat emitting resistance body for coupling the heat emitting resistance body to an external circuit through the exposed portion, and wherein an upper central region of the substrate under the reference electrode and the detection electrode is etched by a predetermined thickness to thermally isolate the reference electrode, the detection electrode, and a portion of the heat emitting resistance body under the reference electrode and the detection electrode from the substrate. 11. The MEMS electrochemical gas sensor of claim 10 , wherein the reference electrode and the detection electrode have an interdigital shape, a hollow box shape, a box shape, or a combination thereof. 12. The MEMS electrochemical gas sensor of claim 1 , wherein the detection electrode is coupled to a bonding wire to transfer signals to the external circuit. 13. The MEMS electrochemical gas sensor of claim 10 , wherein the detection electrode is coupled to a bonding wire to transfer signals to the external circuit.
caused by changes in the thermal conductivity of a surrounding material to be tested (G01N27/20 takes precedence) · CPC title
CO or CO2 · CPC title
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