Methods and apparatus for high-throughput formation of nano-scale arrays

US9493022B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9493022-B2
Application numberUS-201013389113-A
CountryUS
Kind codeB2
Filing dateAug 5, 2010
Priority dateAug 5, 2009
Publication dateNov 15, 2016
Grant dateNov 15, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for printing an array of biomolecular deposits with nanoscale resolution on a substrate, comprising: a parylene stencil including an array of openings and at least one alignment mark, the parylene stencil being capable of being releasably attached to the substrate, each of the openings in the array having at least one dimension of no more than 200 nanometers; and a deposition printer aligned with the parylene stencil to print an array of biomolecular deposits under hydrated conditions on the substrate through the openings of the parylene stencil, the array of biomolecular deposits on the substrate having nanoscale resolution, the array of deposits from the printer being aligned with the array of openings in the stencil through the at least one alignment mark. 2. The apparatus of claim 1 , further comprising an alignment device operatively associated with the stencil and the deposition printer to align the printer with the stencil. 3. The apparatus of claim 2 , wherein the alignment device is a microscopic imaging device. 4. The apparatus of claim 2 , wherein the alignment device is an atomic force microscope. 5. The apparatus of claim 1 , wherein the average size of the deposits from the printer is greater than the average size of the openings in the stencil. 6. The apparatus of claim 5 , wherein the average size of the deposits from the printer is at least two times greater than the average size of the openings in the stencil. 7. The apparatus of claim 1 , wherein the deposition printer is an inkjet printer. 8. The apparatus of claim 7 , wherein the openings have a depth/diameter ratio of no more than about 5. 9. The apparatus of claim 1 , wherein the array of deposits are multiplexed. 10. A method for printing an array of biomolecular deposits with nanoscale resolution on a substrate, the method comprising: placing a parylene stencil over the substrate, the parylene stencil including an array of openings having at least one dimension of no more than 200 nanometers and at least one alignment mark; aligning a deposition printer to the parylene stencil through the at least one alignment mark; printing a first array of biomolecular deposits under hydrated conditions on the substrate through the array of openings in the parylene stencil by the deposition printer, the array of biomolecular deposits on the substrate having nanoscale resolution; and removing the parylene stencil from the substrate. 11. The method of claim 10 , further comprising forming the parylene stencil prior to placing the parylene stencil over the substrate, the parylene stencil being formed by a method comprising: providing an etching mask including a first mask and a second mask over a parylene layer such that the second mask is positioned between the parylene layer and the first mask; forming an array of openings in the etching mask by a first etching process; and transferring the array of openings from the etching mask to the parylene layer by a second etching process to provide the parylene stencil, the second mask being more resistant to the second etching process than the first mask. 12. The method of claim 10 , wherein the first array of deposits are multiplexed. 13. The method of claim 10 , further including the step of printing a second array of deposits on the substrate through the array of openings by the printer. 14. The method of claim 13 , wherein the second array of deposits are multiplexed. 15. The method of claim 13 , wherein the first and second arrays of deposits are capable of interacting with each other. 16. A method for printing a combinatorial array of deposits on a substrate with nanoscale resolution, the method comprising: placing a parylene stencil over the substrate, the parylene stencil including an array of openings each having at least one dimension of no more than 200 nanometers; printing a first array of deposits on the substrate through the array of openings in the parylene stencil, the first array of deposits on the substrate having nanoscale resolution; printing a second array of deposits on the first array of deposits through the array of openings in the parylene stencil, at least one of the first and second arrays of deposits being multiplexed; generating the combinatorial array of deposits on the substrate by allowing the first array of deposits to interact with the second array of deposits; and removing the parylene stencil from the substrate. 17. The method of claim 16 , wherein the interaction between the first and second multiplexed arrays is selected from the group consisting of chemical reactions, receptor-ligand bindings, enzyme-substrate interactions, interactions that generate fluorescence, chemiluminescence or color change, and combinations thereof. 18. The method of claim 16 , wherein the first and second arrays of deposits are both multiplexed.

Assignees

Inventors

Classifications

  • B41M3/006Primary

    Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles · CPC title

  • Digital lithography, e.g. using an inkjet print-head · CPC title

  • Controlled formation of micro- or nanostructures using a template positioned on a substrate · CPC title

  • Regular or irregular arrays of nanoscale structures, e.g. etch mask layer (photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002) · CPC title

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What does patent US9493022B2 cover?
An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be a…
Who is the assignee on this patent?
Tan Christine P, Lin David M, Craighead Harold G, and 1 more
What technology area does this patent fall under?
Primary CPC classification B41M3/006. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Nov 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).