Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-9487863-B2
Application number	US-201514810996-A
Country	US
Kind code	B2
Filing date	Jul 28, 2015
Priority date	Feb 6, 2015
Publication date	Nov 8, 2016
Grant date	Nov 8, 2016

Abstract

A substrate processing apparatus includes: a process chamber configured to process a substrate; a substrate mounting stand installed in the process chamber and configured to hold the substrate; a heating part configured to heat the substrate; a gas rectifying part configured to supply a process gas to the substrate; a sealing part installed in the gas rectifying part; a heat insulating part installed between the sealing part and an upstream side surface of the gas rectifying part; and a first pressure adjusting part connected to the heat insulating part.

First claim

What is claimed is:

1. A substrate processing apparatus comprising:
a process chamber configured to process a substrate;
a substrate mounting stand installed in the process chamber and configured to hold the substrate;
a heating part configured to heat the substrate embedded on the mounting stand;
a gas rectifying part facing the process chamber and installed in an upper portion of the process chamber, and configured to supply a process gas to the substrate;
a sealing part installed between the gas rectifying part and a gas introduction part;
a heat insulating part installed between the sealing part and an upstream side surface, which faces the processing chamber, and located inside of the gas rectifying part, and having an annular groove shape, an inside of the annular grove shape heat insulating part configured to be vacuum exhausted;
a first pressure adjusting part connected to the heat insulating part, and configured to maintain a pressure inside the heat insulating part at a first predetermined pressure; and
a control part configured to control the first pressure adjusting part.

2. The substrate processing apparatus of claim 1 , further comprising:
a cooling channel configured to cool down the sealing part; and
a cooling part configured to supply a refrigerant into the cooling channel,
wherein the control part is configured to control the first pressure adjusting part and the cooling part to maintain a temperature of the upstream side surface at a predetermined temperature.

3. The substrate processing apparatus of claim 1 , wherein the gas rectifying part is configured to have a diameter widening toward an outer periphery of the substrate, the gas rectifying part includes a gas channel via which the gas passes, and the upstream side surface is installed at a surface of an upstream side of the gas channel.

4. The substrate processing apparatus of claim 3 , wherein the heat insulating part is installed to surround the upstream side of the gas channel.

5. The substrate processing apparatus of claim 1 , wherein an exhaust part is installed at an outer periphery of the gas rectifying part, the exhaust part is configured to exhaust an atmosphere in the process chamber, and the exhaust part includes a second heat insulating part at an outer periphery thereof.

6. The substrate processing apparatus of claim 5 , wherein a second pressure adjusting part is connected to the second heat insulating part, and
the control part is configured to control the second pressure adjusting part to maintain a pressure inside the second heat insulating part at a second predetermined pressure.

7. The substrate processing apparatus of claim 6 , wherein a second heating part is installed between the second heat insulating part and the exhaust part, and
the control part is configured to control the second heating part and the second pressure adjusting part to maintain a temperature of the second heat insulating part at a predetermined temperature.

8. The substrate processing apparatus of claim 1 , further comprising a gas supply part configured to supply a gas to the gas rectifying part, wherein the control part is configured to control the gas supply part to sequentially supply the process gas and a reaction gas.

Assignees

• Hitachi Int Electric Inc

Inventors

• Matsui Shun
• Morimitsu Kazuhiro
• Toyoda Kazuyuki

Classifications

• C23C16/4412 Primary

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

• C23C16/455

  characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber · CPC title

• C23C16/46 Primary

  characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) · CPC title

• C23C16/458

  characterised by the method used for supporting substrates in the reaction chamber · CPC title