Insulating glass unit comprising a sheet of glass with a fluorine doped tin oxide coating made from a gas stream comprising a nitric acid solution as oxidizing agent

Patent metadata

Field	Value
Publication number	US-9487438-B2
Application number	US-72693710-A
Country	US
Kind code	B2
Filing date	Mar 18, 2010
Priority date	Mar 18, 2009
Publication date	Nov 8, 2016
Grant date	Nov 8, 2016

Abstract

The present invention provides low-E thin film optical stacks with improved optical and infrared reflecting properties and methods of making the same. More specifically, the present invention provides for a metal oxide thin film coating that exhibits lower emissivity values than its predecessor due to the inclusion of an oxidizer in the metal oxide deposition process, such as a strong acid such as nitric acid. The present invention also provides for a method that increases the coating efficiencies of the thin films described herein.

First claim

What is claimed is:

1. A method of making an insulating glass unit (IGU) comprising a first sheet of glass, a second sheet of glass, and a sealant assembly, the method comprising:
a) providing a first sheet of glass and a second sheet of glass;
b) depositing online, from a first coater positioned online, a first coating of an optical thin film coating on at least a portion of the first sheet of glass;
c) depositing online, from a second coater positioned online, a second coating of the optical thin film coating on at least a portion of the first coating, wherein the second coating comprises fluorine doped tin oxide; and
d) disposing a sealant assembly around the periphery of the first sheet of glass and the second sheet of glass for maintaining the first sheet and the second sheet in a spaced-apart relationship from each other;
wherein the second coating is deposited from a gas stream comprising at least one precursor gas and an oxidizing agent at an elevated temperature;
wherein the oxidizing agent is a solution of 10%-100% nitric acid.

2. The method of claim 1 , wherein the first coating comprises silicon.

3. The method of claim 1 , wherein the first coating comprises silicon in the form of an oxide, nitride or carbide or combinations thereof.

4. The method of claim 1 , wherein the first coating comprises a material selected from the group consisting of silicon oxide, silicon dioxide, silicon nitride, silicon oxynitride, silicon carbide or silicon oxycarbide or combinations thereof.

5. The method of claim 1 , wherein the first coating comprises silicon oxycarbide.

6. The method of claim 1 , wherein the elevated temperature is a temperature in the range of 200° C. to 800° C.

7. The method of claim 1 , wherein the elevated temperature is a temperature in the range of 450° C. to 750° C.

8. The method of claim 1 , wherein the first coating comprises a single layer.

9. The method of claim 1 , wherein the first coating comprises multiple layers.

10. A method of producing an insulating glass unit (IGU) comprising a first sheet of glass, a second sheet of glass, and a sealant assembly, the method comprising:
a) providing a first sheet of glass and a second sheet of glass;
b) depositing online, from a first coater positioned online, a first coating of an optical thin film coating on at least a portion of the first sheet of glass;
c) depositing online, from a second coater positioned online, a second coating of the optical thin film coating on at least a portion of the first coating, wherein the second coating comprises fluorine doped tin oxide, wherein the second coating is deposited from a gas stream comprising at least one precursor gas and an oxidizing agent at an elevated temperature; and
d) disposing a sealant assembly around the periphery of the first sheet of glass and the second sheet of glass for maintaining the first sheet and the second sheet in a spaced-apart relationship from each other;
wherein the oxidizing agent is a solution of 10%-100% nitric acid; and
wherein the second coating has an emissivity value that is at least about 0.04 lower than the emissivity value of a second coating deposited in the absence of nitric acid.

11. The method of claim 10 , wherein the first coating comprises silicon.

12. The method of claim 10 , wherein the first coating comprises silicon in the form of an oxide, nitride or carbide or combinations thereof.

13. The method of claim 10 , wherein the first coating comprises a material selected from the group consisting of silicon oxide, silicon dioxide, silicon nitride, silicon oxynitride, silicon carbide or silicon oxycarbide or combinations thereof.

14. The method of claim 10 , wherein the first coating comprises silicon oxycarbide.

15. The method of claim 10 , wherein the elevated temperature is a temperature in the range of 200° C. to 800° C.

16. The method of claim 10 , wherein the elevated temperature is a temperature in the range of 450° C. to 750° C.

17. The method of claim 10 , wherein the first coating comprises a single layer.

18. The method of claim 10 , wherein the first coating comprises multiple layers.

19. The method of claim 1 ,
wherein the second coating has a thickness that is at least about 20% greater than the thickness of a second coating deposited in the absence of nitric acid.

20. The method of claim 1 ,
wherein the second coating has a solar shading coefficient at least about 0.01 percent higher than the solar shading coefficient of a second coating of about the same thickness deposited in the absence of nitric acid.

21. The method of claim 1 , further comprising
depositing online, from a first precoater positioned online, a precoating on at least a portion of the first sheet of glass;
wherein the first coating is also deposited on at least a portion of the precoating; and further
wherein the second coating has an optical transmission rate at least about 0.9 percent higher than the optical transmission rate of a second coating of about the same thickness deposited in the absence of nitric acid.

22. The method of claim 1 ,
wherein the second coating has a haze at least about 0.25 percent lower than the haze of a second coating of about the same thickness deposited in the absence of nitric acid.

23. The method of claim 1 , further comprising
depositing online, from a first precoater positioned online, a precoating on at least a portion of the first sheet of glass;
wherein the first coating is also deposited on at least a portion of the precoating; and further
wherein the second coating has a haze at least about 0.25 percent lower than the haze of a second coating of about the same thickness deposited in the absence of nitric acid.

24. The method of claim 21 , wherein the precoating comprises a material selected from the group consisting of titanium oxide, titanium nitride, titanium carbide or oxycarbide or combinations thereof.

25. The method of claim 23 , wherein the precoating comprises a material selected from the group consisting of titanium oxide, titanium nitride, titanium carbide or oxycarbide or combinations thereof.

26. The method of claim 21 , wherein the precoating comprises titanium dioxide.

27. The method of claim 23 , wherein the precoating comprises titanium dioxide.

Assignees

• Cording Christopher R
• Tixhon Eric
• Schutz Alain
• Agc Flat Glass Na Inc
• Agc Glass Europe S A

Inventors

• Cording Christopher R
• Tixhon Eric
• Schutz Alain

Classifications

• C03C17/3441 Primary

  comprising carbon, a carbide or oxycarbide · CPC title

• C03C17/3417

  all coatings being oxide coatings · CPC title

• C03C17/3452

  comprising a fluoride · CPC title

• C03C17/3435

  comprising a nitride, oxynitride, boronitride or carbonitride · CPC title

• C03C2218/1525

  by atmospheric CVD · CPC title