Heat treatment method for synthetic quartz glass

Patent metadata

Field	Value
Publication number	US-9409812-B2
Application number	US-201313945631-A
Country	US
Kind code	B2
Filing date	Jul 18, 2013
Priority date	Aug 27, 2012
Publication date	Aug 9, 2016
Grant date	Aug 9, 2016

Abstract

[Problem]
The provision of a synthetic quartz glass heat treatment method that can, by a single heat treatment, and without particular limitations on the OH group concentration distribution of the starting material, regulate the birefringence fast axis direction in the synthetic quartz glass after it has been heat-treated.
[Means of overcoming the problem]
A heat treatment method for synthetic quartz glass whereby columnar synthetic quartz glass having two opposing end faces and a lateral face is heat-treated covered with thermal insulator; wherein said heat treatment is performed using as end face thermal insulator which covers said two end faces, and as lateral face thermal insulator which covers said lateral face, thermal insulators that differ in at least either type or thickness to afford different thermal insulation effects such that the birefringence fast axis direction of said synthetic quartz glass is regulated.

First claim

The invention claimed is:

1. A heat treatment method for synthetic quartz glass, said method comprising:
heat treating a columnar synthetic quartz glass article having two opposing end faces and a lateral face covered with thermal insulator;
wherein said thermal insulator has an end-face thermal insulator that covers said two end faces, and a lateral-face thermal insulator that covers said lateral face,
said end-face and lateral face thermal insulators each having a respective type or thickness, wherein at least either said types or said thicknesses differ so as to afford different thermal insulation effects so as to regulate a birefringence fast axis direction of said synthetic quartz glass article either in a tangential direction or in a radial direction such that after the heat treating the synthetic quartz glass article
a. has a regulated distribution of said birefringence fast axis direction, and
b. has birefringence such that either a radial/tangential ratio of a radial mean value to a tangential mean value or a tangential/radial ratio of the tangential mean value to the radial mean value is 2:1 or greater,
wherein the radial mean value is according to the formula

∑

i
=
1

n

⁢

Re
i

·
cos

⁢

⁢

θ
i

n

 and the tangential mean value is according to the formula

∑

i
=
1

n

⁢

Re
i

·
sin

⁢

⁢

θ
i

n

 for a number n of measurements of respective magnitudes of birefringence (Re i ) and of respective angles (θ i ) of the fast axis direction relative to a radius at respective measurement points (a i ) on the synthetic quartz glass article; and
wherein, when the tangential mean value is higher than the radial mean value, the fast axis direction of said synthetic quartz glass article is the tangential direction, and, when the radial mean value is higher than the tangential mean value, the fast axis direction of said synthetic quartz glass article is the radial direction; and
wherein the birefringence fast axis direction of said synthetic quartz glass article is regulated in a tangential direction of said end face by causing the thermal insulation effect of said end face thermal insulator to be greater than the thermal insulation effect of said lateral face thermal insulator.

2. The heat treatment method for synthetic quartz glass as claimed in claim 1 , wherein said thermal insulator is a quartz glass container that is configured to house said synthetic quartz glass article.

3. The heat treatment method for synthetic quartz glass as claimed in claim 2 , wherein SiO 2 powder or SiO 2 fibers are packed inside said quartz glass container.

4. The synthetic quartz glass heat treatment method as claimed in claim 1 , wherein said synthetic quartz glass is optical synthetic quartz glass configured to be used in an optical system in an exposure apparatus.

5. A heat treatment method for synthetic quartz glass, said method comprising:
heat treating a first columnar synthetic quartz glass article having two opposing end faces and a lateral face covered with thermal insulator;
wherein said thermal insulator has an end-face thermal insulator that covers said two end faces, and a lateral-face thermal insulator that covers said lateral face,
said end-face and lateral face thermal insulators each having a respective type or thickness, wherein at least either said types or said thicknesses differ so as to afford different thermal insulation effects so as to regulate a birefringence fast axis direction of said synthetic quartz glass article either in a tangential direction or in a radial direction such that after the heat treating the synthetic quartz glass article
a. has a regulated distribution of said birefringence fast axis direction, and
b. has birefringence such that either a radial/tangential ratio of a radial mean value to a tangential mean value or a tangential/radial ratio of the tangential mean value to the radial mean value is 2:1 or greater,
wherein the radial mean value is according to the formula

∑

i
=
1

n

⁢

Re
i

·
cos

⁢

⁢

θ
i

n

and the tangential mean value is according to the formula

∑

i
=
1

n

⁢

Re
i

·
sin

⁢

⁢

θ
i

n

 for a number n of measurements of respective magnitudes of birefringence (Re i ) and of respective angles (θ i ) of the fast axis direction relative to a radius at respective measurement points (a i ) on the synthetic quartz glass article; and
wherein, when the tangential mean value is higher than the radial mean value, the fast axis direction of said synthetic quartz glass article is the tangential direction, and, when the radial mean value is higher than the tangential mean value, the fast axis direction of said synthetic quartz glass article is the radial direction; and
wherein a second columnar synthetic quartz glass article is prepared having respective end faces and a respective lateral side with a respective end face thermal insulator that covers said two end face

Assignees

• Harada Shigeo
• Heraeus Quarzglas
• Shin-Etsu Quartz Products Co Ltd

Inventors

• Harada Shigeo

Classifications

• C03B25/00

  Annealing glass products · CPC title

• C03B32/00 Primary

  Thermal after-treatment of glass products not provided for in groups {C03B19/00} , C03B25/00 - C03B31/00 {or C03B37/00}, e.g. crystallisation, eliminating gas inclusions or other impurities; {Hot-pressing vitrified, non-porous, shaped glass products} · CPC title

• C03B19/1453

  Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering · CPC title

• C03B19/066

  for the production of quartz or fused silica articles (other processes specially adapted for the production of quartz or fused silica articles C03B20/00) · CPC title