Metal foil for electromagnetic shielding, electromagnetic shielding material, and shielding cable

US9485894B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9485894-B2
Application numberUS-201414902188-A
CountryUS
Kind codeB2
Filing dateFeb 20, 2014
Priority dateJul 3, 2013
Publication dateNov 1, 2016
Grant dateNov 1, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A metal foil for electromagnetic shielding, comprising: a metal foil base, an Sn—Ni alloy layer formed on one or both surfaces of the base, and an oxide layer formed on a surface of the Sn—Ni alloy layer, wherein the Sn—Ni alloy layer includes 20 to 80% by mass of Sn and has a thickness of 30 to 500 nm, and wherein when an analysis in a depth direction is carried out by an XPS being the depth from an outermost surface as X nm, and an atomic percentage (%) of Sn is represented by A Sn (X), an atomic percentage (%) of Ni is represented by A Ni (X), an atomic percentage (%) of oxygen is represented by A O (X), and X is defined to be X O when A O (X)=0, 30 nm=>X O =>0.5 nm, and 0.4=>∫A Ni (X)dx/∫A Sn (X)dx=>0.05 in a section [0, X 0 ] is satisfied.

First claim

Opening claim text (preview).

What is claimed is: 1. A metal foil for electromagnetic shielding, comprising: a metal foil base, an Sn—Ni alloy layer formed on one or both surfaces of the base, and an oxide layer formed on a surface of the Sn—Ni alloy layer, wherein the Sn—Ni alloy layer includes 20 to 80% by mass of Sn and has a thickness of 30 to 500 nm, and wherein when an analysis in a depth direction is carried out by XPS with the depth from an outermost surface as X nm, and an atomic percentage (%) of Sn is represented by A Sn (X), an atomic percentage (%) of Ni is represented by A Ni (X), an atomic percentage (%) of oxygen is represented by A O (X), and X is defined to be X O when A O (X)=0, 30 nm≧X O ≧0.5 nm, and 0.4≧∫A Ni (X)dx/∫A Sn (X)dx≧0.05 in a section [0, X 0 ] is satisfied. 2. The metal foil for electromagnetic shielding according to claim 1 , wherein the Sn—Ni alloy layer further includes one or more elements selected from the group consisting of P, W, Fe and Co. 3. The metal foil for electromagnetic shielding according to claim 1 , wherein the Sn—Ni alloy layer includes 10% by mass of an element configuring the base. 4. The metal foil for electromagnetic shielding according to claim 1 , further comprising: an underlayer composed of a Ni metal layer or an alloy layer of Ni and P, W, Fe, Co or Zn formed between the Sn—Ni alloy layer and the base. 5. The metal foil for electromagnetic shielding according to claim 1 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy. 6. The metal foil for electromagnetic shielding according to claim 1 , wherein the base is aluminum or an aluminum alloy, and wherein a Zn layer is formed between the base and an underlayer. 7. An electromagnetic shielding material, comprising the metal foil for electromagnetic shielding according to claim 1 , and a resin layer laminated on one surface of the metal foil. 8. The electromagnetic shielding material according to claim 7 , wherein the resin layer is a resin film. 9. A shielding cable shielded by the electromagnetic shielding material according to claim 7 . 10. A shielding cable shielded by the electromagnetic shielding material according to claim 8 . 11. The metal foil for electromagnetic shielding according to claim 2 , wherein the Sn—Ni alloy layer includes 10% by mass of an element configuring the base. 12. The metal foil for electromagnetic shielding according to claim 2 , further comprising: an underlayer composed of a Ni metal layer or an alloy layer of Ni and P, W, Fe, Co or Zn formed between the Sn—Ni alloy layer and the base. 13. The metal foil for electromagnetic shielding according to claim 3 , further comprising: an underlayer composed of a Ni metal layer or an alloy layer of Ni and P, W, Fe, Co or Zn formed between the Sn—Ni alloy layer and the base. 14. The metal foil for electromagnetic shielding according to claim 2 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy. 15. The metal foil for electromagnetic shielding according to claim 3 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy. 16. The metal foil for electromagnetic shielding according to claim 4 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy. 17. The metal foil for electromagnetic shielding according to claim 2 , wherein the base is aluminum or an aluminum alloy, and wherein a Zn layer is formed between the base and an underlayer. 18. The metal foil for electromagnetic shielding according to claim 3 , wherein the base is aluminum or an aluminum alloy, and wherein a Zn layer is formed between the base and an underlayer. 19. The metal foil for electromagnetic shielding according to claim 4 , wherein the base is aluminum or an aluminum alloy, and wherein a Zn layer is formed between the base and the underlayer. 20. The metal foil for electromagnetic shielding according to claim 5 , wherein the base is aluminum or an aluminum alloy, and wherein a Zn layer is formed between the base and an underlayer.

Assignees

Inventors

Classifications

  • Electromagnetic interference shielding · CPC title

  • containing more than 50% by weight of iron or nickel or cobalt · CPC title

  • at least one layer being of nickel or chromium · CPC title

  • with at least one oxide layer · CPC title

  • C25D5/505Primary

    of electroplated tin coatings, e.g. by melting · CPC title

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What does patent US9485894B2 cover?
A metal foil for electromagnetic shielding, comprising: a metal foil base, an Sn—Ni alloy layer formed on one or both surfaces of the base, and an oxide layer formed on a surface of the Sn—Ni alloy layer, wherein the Sn—Ni alloy layer includes 20 to 80% by mass of Sn and has a thickness of 30 to 500 nm, and wherein when an analysis in a depth direction is carried out by an XPS being the depth f…
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification C25D5/505. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 01 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).