Multiple gases providing method and multiple gases providing apparatus
US-2017372929-A1 · Dec 28, 2017 · US
Apparatus for dividing and supplying gas and method for dividing and supplying gas
US9477232B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9477232-B2 |
| Application number | US-201414473493-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 29, 2014 |
| Priority date | Aug 30, 2013 |
| Publication date | Oct 25, 2016 |
| Grant date | Oct 25, 2016 |
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Abstract
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An apparatus for dividing and supplying gas is provided with a flow rate control device, a plurality of divided flow passages of gas flowing from the flow rate control device, thermal-type mass flow sensors disposed to the divided flow passages, electrically-operated valves disposed on a downstream side of the thermal-type mass flow sensors, controllers that control the electrically-operated valves, and a flow ratio setting calculator that calculates a total flow rate, then calculates flow rates of the divided flow passages, and then inputs the calculated flow rates as set flow rates to each controllers. One of the divided flow passages with the highest set flow rate is put in an uncontrolled state, and opening degree for each of the rest divided flow passages is controlled, and then feedback control of the divided flow rate of each of the divided flow passages is implemented by each of the controllers.
First claim
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The invention claimed is: 1. An apparatus for dividing and supplying gas, the apparatus comprising: a flow rate control device that controls gas from a gas supply source; a plurality of divided flow passages that are connected in parallel with each other, wherein gas flowing from the flow rate control device is divided and supplied to a location where the gas is used via the plurality of divided flow passages; a plurality of thermal-type mass flow sensors, wherein a thermal-ty…
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Physics · mapped topic
Physics · mapped topic
- G05D7/0664Primary
Physics · mapped topic
Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
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Frequently asked questions
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- What does patent US9477232B2 cover?
- An apparatus for dividing and supplying gas is provided with a flow rate control device, a plurality of divided flow passages of gas flowing from the flow rate control device, thermal-type mass flow sensors disposed to the divided flow passages, electrically-operated valves disposed on a downstream side of the thermal-type mass flow sensors, controllers that control the electrically-operated va…
- Who is the assignee on this patent?
- Fujikin Kk, Tokyo Electron Ltd
- What technology area does this patent fall under?
- Primary CPC classification G05D7/0664. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Oct 25 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).