Method for reproducing template and reproducing apparatus

US9475213B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9475213-B2
Application numberUS-201213606199-A
CountryUS
Kind codeB2
Filing dateSep 7, 2012
Priority dateSep 22, 2011
Publication dateOct 25, 2016
Grant dateOct 25, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An aspect of the present disclosure, there is provided a method for reproducing a template. The template includes a transfer surface and a release layer. The transfer surface has a concavoconvex pattern. The release layer includes an inorganic functional group and an organic functional group, both being bonded to the transfer surface. The method for reproducing the template includes the following two steps: removing the organic functional group by oxidizing and decomposing the organic functional group included in the release layer; and removing the inorganic functional group; and forming the release layer by coupling a silane coupling agent with the transfer surface.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for reproducing a template, comprising: forming a release layer on a transfer surface of the template, the release layer including Si—O bondings and an organic functional group, both being bonded to the transfer surface, the transfer surface having a concavoconvex pattern to be transferred; oxidizing and decomposing the organic functional group included in the release layer to remove the organic functional group and to expose the Si—O bondings; removing the Si—O bondings by a chemical solution including at least one selected from of ammonia, choline, sodium hydrate and hydrogen fluoride; and forming the release layer by coupling a silane coupling agent with the transfer surface. 2. The method of claim 1 , wherein etching is conducted by 0.15 nm or more in the removing of the Si—O bondings. 3. The method of claim 1 , wherein the oxidizing and decomposing is conducted by treating with ultraviolet irradiation, plasma irradiation, or ozone treatment. 4. The method of claim 1 , wherein the release layer contains an inorganic functional group containing silicon atoms of the silane coupling agent, the silicon atoms being covalently bound with the transfer surface via oxygen atoms, and an organic functional group being adjacent to the silicon atoms. 5. The method of claim 1 , wherein the organic functional group contains an alkyl group or a fluoro group.

Assignees

Inventors

Classifications

  • B29C33/58Primary

    Applying the releasing agents · CPC title

  • Manufacturing moulds, e.g. shaping the mould surface by machining · CPC title

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Frequently asked questions

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What does patent US9475213B2 cover?
An aspect of the present disclosure, there is provided a method for reproducing a template. The template includes a transfer surface and a release layer. The transfer surface has a concavoconvex pattern. The release layer includes an inorganic functional group and an organic functional group, both being bonded to the transfer surface. The method for reproducing the template includes the followi…
Who is the assignee on this patent?
Kobayashi Masako, Hirabayashi Hideaki, Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification B29C33/58. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 25 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).