Electronic device manufacturing method and sputtering method

Patent metadata

Field	Value
Publication number	US-9472384-B2
Application number	US-201514753656-A
Country	US
Kind code	B2
Filing date	Jun 29, 2015
Priority date	Mar 24, 2010
Publication date	Oct 18, 2016
Grant date	Oct 18, 2016

Abstract

An electronic device manufacturing method includes a first step of moving a substrate holder close to a first shield member and locating a first projecting portion formed on the first shield member and having a ring shape and a second projecting portion having a ring shape and formed on a second shield member installed on the surface of the substrate holder at the outer peripheral portion of a substrate at a position to engage with each other in a noncontact state, a second step of, after the first step, sputtering a target while maintaining the first projecting portion and the second projecting portion at the position to engage with each other in the noncontact state, and a third step of, after the second step, setting the first shield member in an open state and sputtering the target to perform deposition on the substrate.

First claim

The invention claimed is:

1. A shield member used in a vacuum container, which includes a target holder configured to hold a target and a substrate holder configured to connect an up-and-down mechanism capable of moving the substrate holder in a vertical direction and configured to have a substrate placement surface capable of having one substrate placed thereon, the shield member comprising:
a first member capable of being arranged between the substrate holder and the target holder and configured to set, by an operation of a first rotation driving unit, a closed state in which the substrate holder is shielded from the target holder or an open state in which the substrate holder is opened to the target holder, wherein when the first member is inserted between the substrate holder and the target holder, the first member sets the closed state, and when the first member is retreated from between the substrate holder and the target holder, the first member sets the open state; and
a second member which is arranged, in contact with the substrate placement surface, on a side of the substrate placement surface of the substrate holder and at both outer peripheral edge portions of the one substrate and is configured to have a ring shape capable of holding both outer peripheral edge portions,
wherein a first concentric projecting portion, extending in a direction of the second member and having at least one ring shape, is formed in contact with a surface of the first member, and
wherein a second concentric projecting portion, engaging with the first concentric projecting portion in a noncontact state at a position when the first member is inserted between the substrate holder and the target holder by the first rotation driving unit and the substrate holder is moved up by the up-and-down mechanism and the substrate holder comes close to the first member, and extending in a direction of the first member and having at least one ring shape, is formed on a surface of the second member.

2. The shield member according to claim 1 , wherein a projection height of the first concentric projecting portion, from a flat surface of the first member, is indicated as H 1 , a projection height of the second concentric projecting portion, from a flat surface of the second member, is indicated as H 2 , and a distance, between the flat surface of the first member and the flat surface of the second member, is indicated as D 1 , and
wherein when the second concentric projecting portion is engaged with the first concentric projecting portion in the noncontact state, the relationship D 1 <H 1 +H 2 is satisfied.

3. The shield member according to claim 2 , wherein a distance when the first member and the second member do not contact each other when the first member is inserted/retreated satisfies the relationship D 1 >H 1 +H 2 .

Assignees

• Canon Anelva Corp

Inventors

• Yamaguchi Nobuo
• Matsuo Kazuaki

Classifications

• H10P14/42 Primary

  using a gas or vapour · CPC title

• H01J37/3405

  Magnetron sputtering · CPC title

• H01J37/3441 Primary

  Dark space shields · CPC title

• H01J2237/3323

  uniformity · CPC title

• H01J37/3447

  Collimators, shutters, apertures · CPC title