Plasma reactor for abatement of hazardous material

Patent metadata

Field	Value
Publication number	US-9472381-B2
Application number	US-201514698938-A
Country	US
Kind code	B2
Filing date	Apr 29, 2015
Priority date	Apr 30, 2014
Publication date	Oct 18, 2016
Grant date	Oct 18, 2016

Abstract

A plasma reactor for abating hazardous materials included in process gases while being installed on an exhaust path of the process gases toward a vacuum pump is provided. The plasma reactor includes an insulator having a pipe shape through which process gases pass, a first ground electrode connected to a front end of the insulator facing the process chamber, a second ground electrode connected to a rear end of the insulator and provided with a facing part that faces a center of the inside of the insulator along the moving direction of process gases, and a driving electrode fixed to an external circumferential surface of the insulator and connected to a power supply applying an AC or RF voltage.

First claim

What is claimed is:

1. A plasma reactor for abating hazardous materials included in process gases, and installed on an exhaust path of the process gases toward a vacuum pump, comprising:
an insulator having a pipe shape through which the process gases pass;
a first ground electrode connected to a front end of the insulator facing a process chamber;
a second ground electrode connected to a rear end of the insulator, and provided with a facing part that faces a center of the inside of insulator along the moving direction of the process gases; and
a driving electrode fixed to an external circumferential surface of the insulator, and connected to a power supply applying an AC or RF voltage,
wherein a predetermined space is provided between the inside was of the facing part and the second ground electrode through which the process gases are released.

2. The plasma reactor for abating hazardous materials of claim 1 , wherein the facing part is spaced apart from an inner wall of the second ground electrode, and is formed with a planar shape that intersects the exhaust path of the process gases.

3. The plasma reactor for abating hazardous materials of claim 2 , wherein the facing part is fixed to the inner wall of the second ground electrode via at least one connection part.

4. The plasma reactor for abating hazardous materials of claim 2 , wherein the second ground electrode forms an extension part around the facing part, and the facing part has a larger diameter than a diameter of the second ground electrode except the extension part.

5. The plasma reactor for abating hazardous materials of claim 2 , wherein a protrusion part is formed on a surface of the facing part that faces the insulator.

6. The plasma reactor for abating hazardous materials of claim 4 , wherein the extension part functions as a particle collecting box, a supporting part is located inside of the particle collecting box and between a lower surface of the facing part and the second ground electrode, and the supporting part forms at least one opening to release the process gases.

7. The plasma reactor for abating hazardous materials of claim 4 , wherein the extension part functions as a particle collecting box and is provided with a bottom part, and the second ground electrode is comprised of a first pipe portion and a second pipe portion which cross with the particle collecting box between them.

8. The plasma reactor for abating hazardous materials of claim 1 , wherein the second ground electrode is comprised of a first pipe portion connected to a rear end of the insulator and a second pipe portion intersecting the first pipe portion, and a part of the second pipe portion facing the inside of the first pipe portion such that a part of the second portion functions as the facing part.

9. The plasma reactor for abating hazardous materials of claim 8 , wherein the second pipe portion is provided with a length extension part that has a closed end at a part intersecting the first pipe portion.

10. The plasma reactor for abating hazardous materials of claim 8 , wherein a protrusion part is formed at a surface of the facing part and of which diameter is greater than an inner diameter of the first pipe portion, and a thickness of the protrusion part is smaller than an inner diameter of the second pipe portion.

11. The plasma reactor for abating hazardous materials of claim 8 , wherein a protrusion part is formed at a surface of the facing part and of which diameter is greater than an inner diameter of the first pipe portion, and a thickness of the protrusion part is greater than an inner diameter of the second pipe portion.

12. The plasma reactor for abating hazardous materials of claim 1 , wherein the first ground electrode and the second ground electrode include variable diameter parts of which diameter increases closer to the insulator, and the facing part is located at a rear part of the variable diameter part provided at the second ground electrode.

13. The plasma reactor for abating hazardous materials of claim 1 , wherein the first ground electrode forms a reaction gas inlet through which the reaction gas is injected.

14. The plasma reactor for abating hazardous materials of claim 1 , wherein the first ground electrode is disposed apart from a first inlet for injecting a first reaction gas along a moving direction of the process gases and a second inlet for injecting a second reaction gas, and a residence time when the first reaction gas stays inside of the plasma is different from a residence time when the second reaction gas stays inside of the plasma.

Assignees

• Korea Mach & Materials Inst

Inventors

• Hur Min
• Kang Woo Seok
• Lee Jae Ok

Classifications

• H01J37/32834

  Exhausting · CPC title

• H01J37/32091

  the radio frequency energy being capacitively coupled to the plasma · CPC title

• H05H2245/1215

  Electricity · mapped topic

• Y02C20/30

  of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6] · CPC title

• H05H2001/4667

  Electricity · mapped topic