One-piece double balance spring and method of manufacturing the same

US9459589B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9459589-B2
Application numberUS-40813009-A
CountryUS
Kind codeB2
Filing dateMar 20, 2009
Priority dateMar 20, 2008
Publication dateOct 4, 2016
Grant dateOct 4, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The invention relates to a double balance spring ( 21 ) including, made in a layer of silicon-based material ( 11 ), a first balance spring ( 23 ) coaxially mounted on a collet ( 13, 27 ), the collet ( 13, 27 ) including an extending part ( 9 ) that projects from said balance spring and which is made in a second layer of silicon-based material ( 5 ). According to the invention, said extending part extends ( 17 ) into a third layer ( 7 ) of silicon-based material coaxially with a second balance spring ( 25 ) so as to form a one-piece double balance spring ( 21 ) made of silicon-based materials. The invention also relates to a timepiece including a balance spring of this type and the method of manufacturing the same. The invention concerns the field of timepiece movements.

First claim

Opening claim text (preview).

What is claimed is: 1. A one-piece double balance spring, made from a three layer silicon based material by a method comprising the steps of: (i) providing a silicon material having first and second layers; (ii) etching a central collet portion in the second layer; (iii) securing a third layer on the second layer; (iv) etching a first balance spring having a first collet portion in the first layer of silicon-based material so that the first collet portion is coaxially mounted on the central collet portion; and (v) etching a second balance spring having a second collet portion in the third layer of silicon-based material so that the second collet portion is coaxial with the central collet portion, thereby forming the one-piece double balance spring, wherein the first collet portion, the second collet portion and the central collet portion form a single collet wherein the central collet portion is a spacing means defining a space between the first balance spring and the second balance spring. 2. The one-piece double balance spring according to claim 1 , wherein the single collet has a similar section in each of the first, second and third layer portions of which it is respectively comprised. 3. The one-piece double balance spring according to claim 1 , wherein the single collet has a substantially different section across at least one of the first, second and third layer portions of which it is respectively comprised. 4. The one-piece double balance spring according to claim 1 , wherein the first and second balance springs include coils wound in a same direction. 5. The one-piece double balance spring according to claim 1 , wherein the first and second balance springs include coils wound in different directions. 6. The one-piece double balance spring according to claim 1 , wherein ends of outer curves of each of the first and second balance springs are aligned vertically one above the other to allow a single means to be used to pin the one-piece double balance spring to the single collet. 7. The one-piece double balance spring according to claim 1 , wherein the first and second balance springs have a same angular stiffness. 8. The one-piece double balance spring according to claim 1 , wherein the first and second balance springs each have a distinct angular stiffness from the other. 9. The one-piece double balance spring according to claim 1 , wherein at least one of the first and second balance springs has at least one silicon dioxide-based part so as to make the one-piece double balance spring mechanically resistant and to adjust a thermo-elastic coefficient thereof. 10. The one-piece double balance spring according to claim 1 , wherein an inner coil of at least one of the first and second balance springs has a Grossmann curve. 11. The one-piece double balance spring according to claim 1 , wherein the single collet has one metal part to receive an arbour that is driven therein. 12. A timepiece including the one-piece double balance spring according to claim 1 . 13. The one-piece double balance spring according to claim 1 , wherein the first collet portion, the central collet portion and the second collet portion respectively comprises a central arbour receiving opening. 14. A method of manufacturing a one-piece double balance spring, made from a three layer silicon-based material, the method comprising: (i) providing a silicon material having first and second layers; (ii) etching a central collet portion in the second layer; (iii) securing a third layer on the second layer; (iv) etching a first balance spring having a first collet portion in the first layer of silicon-based material so that the first collet portion is coaxially mounted on the central collet portion; and (v) etching a second balance spring having a second collet portion in the third layer of silicon-based material so that the second collet portion is coaxial with the central collet portion, thereby forming the one-piece double balance spring, wherein the first collet portion, the second collet portion and the central collet portion form a single collet wherein the central collet portion is a spacing means defining a space between the first balance spring and the second balance spring. 15. The method according to claim 14 , wherein, after step (iv), the method further comprises: oxidizing the first balance spring, so as to make the one-piece double balance spring more mechanically resistant and to adjust a thermo-elastic coefficient thereof. 16. The method according to claim 14 , wherein, after step (v), the method further comprises: oxidizing the second balance spring, so as to make the one-piece double balance spring more mechanically resistant and to adjust a thermo-elastic coefficient thereof. 17. The method according to claim 14 , wherein, prior to step (v), the method further comprises: selectively depositing at least one metal layer on the third layer to define a pattern of a metal part on the single collet. 18. The method according to claim 17 , wherein the selectively depositing includes: growing a deposition by successive metal layers at least partially over a surface of the third layer so as to form the metal part to receive an arbour that is driven therein. 19. The method according to claim 17 , wherein the selectively depositing includes: selectively etching at least one cavity in the third layer to receive the metal part; growing a deposition by successive metal layers at least partially in the at least one cavity so as to form the metal part to receive an arbour, which is driven therein. 20. The method according to claim 17 , wherein the selectively depositing includes: polishing the at least one metal layer that is deposited. 21. The method according to claim 14 , wherein several of the one-piece double balance springs are made on a same substrate.

Assignees

Inventors

Classifications

  • G04B17/066Primary

    Manufacture of the spiral spring (locking of the spiral spring by the regulating lever G04B18/026; spiral spring with temperature compensation G04B17/227; fixation of the spiral spring on the collet G04B17/32; mainspring G04B1/14) · CPC title

  • Spring making · CPC title

  • for coil-springs (coil-springs in general B21F; springs for the driving mechanism G04D3/0007) · CPC title

  • for fastening the hairspring onto the balance · CPC title

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What does patent US9459589B2 cover?
The invention relates to a double balance spring ( 21 ) including, made in a layer of silicon-based material ( 11 ), a first balance spring ( 23 ) coaxially mounted on a collet ( 13, 27 ), the collet ( 13, 27 ) including an extending part ( 9 ) that projects from said balance spring and which is made in a second layer of silicon-based material ( 5 ). According to the invention, said extending p…
Who is the assignee on this patent?
Bühler Pierre-André, Verardo Marco, Conus Thierry, and 4 more
What technology area does this patent fall under?
Primary CPC classification G04B17/066. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 04 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).