Semiconductor device manufacturing method and semiconductor device manufactured using the same
US-2024395745-A1 · Nov 28, 2024 · US
US9455292B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9455292-B2 |
| Application number | US-201514741561-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 17, 2015 |
| Priority date | Oct 11, 2014 |
| Publication date | Sep 27, 2016 |
| Grant date | Sep 27, 2016 |
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Official abstract text for this publication.
An image sensing device may include an interconnect layer, an image sensor IC coupled to the interconnect layer and having an image sensing surface, and an IR filter aligned with the image sensing surface opposite the interconnect layer. The image sensing device may include a flexible interconnect layer aligned with the interconnect layer and having a flexible substrate extending laterally outwardly from the interconnect layer, and electrically conductive traces on the flexible substrate. The image sensing device may also include solder bodies coupling the interconnect layer and the flexible interconnect layer and also defining a gap between the interconnect layer and the flexible interconnect layer.
Opening claim text (preview).
That which is claimed is: 1. An image sensing device comprising: an interconnect layer; an image sensor integrated circuit (IC) coupled to said interconnect layer and having an image sensing surface opposite said interconnect layer; an infrared (IR) filter aligned with the image sensing surface; a lens assembly aligned with said IR filter; a flexible interconnect layer aligned with said interconnect layer and comprising a flexible substrate extending laterally outwardly f…
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