Photoresist pattern trimming methods
US-9209035-B2 · Dec 8, 2015 · US
Photoresist pattern trimming compositions and methods
US9448486B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9448486-B2 |
| Application number | US-201414586945-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 30, 2014 |
| Priority date | Dec 30, 2013 |
| Publication date | Sep 20, 2016 |
| Grant date | Sep 20, 2016 |
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Abstract
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Provided are compositions and methods for trimming a photoresist pattern. The photoresist pattern trimming composition comprises: a matrix polymer comprising a unit formed from a monomer of the following general formula (I): wherein: R 1 is chosen from hydrogen, fluorine, C 1 -C 3 alkyl and C 1 -C 3 fluoroalkyl; R 2 is chosen from C 1 -C 15 alkylene; and R 3 is chosen from C 1 -C 3 fluoroalkyl; an aromatic acid that is free of fluorine; and a solvent. The compositions and methods find particular applicability in the manufacture of semiconductor devices.
First claim
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What is claimed is: 1. A photoresist pattern trimming composition, comprising: a matrix polymer comprising a unit formed from a monomer of the following general formula (I): wherein: R 1 is chosen from hydrogen, fluorine, C 1 -C 3 alkyl and C 1 -C 3 fluoroalkyl; R 2 is chosen from C 1 -C 15 alkylene; and R 3 is chosen from C 1 -C 3 fluoroalkyl; an aromatic a…
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Physics · mapped topic
- G03F7/405Primary
Physics · mapped topic
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- What does patent US9448486B2 cover?
- Provided are compositions and methods for trimming a photoresist pattern. The photoresist pattern trimming composition comprises: a matrix polymer comprising a unit formed from a monomer of the following general formula (I): wherein: R 1 is chosen from hydrogen, fluorine, C 1 -C 3 alkyl and C 1 -C 3 fluoroalkyl; R 2 is chosen from C 1 -C 15 alkylene; and R 3 is …
- Who is the assignee on this patent?
- Rohm & Haas Elect Mat
- What technology area does this patent fall under?
- Primary CPC classification G03F7/405. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Sep 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).