Vibration Measurement Device
US-2024410745-A1 · Dec 12, 2024 · US
US9442482B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9442482-B2 |
| Application number | US-201313872734-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 29, 2013 |
| Priority date | Apr 29, 2013 |
| Publication date | Sep 13, 2016 |
| Grant date | Sep 13, 2016 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Systems, machines, and methods for monitoring wafer handling are disclosed herein. A system for monitoring wafer handling includes a sensor and a controller. The sensor is capable of being secured to an assembled wafer handling machine. The controller is in electronic communication with the sensor and includes control logic. The control logic is configured to store a reference output of the sensor when the wafer handling machine is aligned and is configured to generate an indication signal when a difference between the reference output and a current output of the sensor exceeds a threshold.
Opening claim text (preview).
The invention claimed is: 1. A system for monitoring wafer handling, the system comprising: a sensor capable of being secured to an assembled wafer handling machine; an imaging device; and a controller in electronic communication with the sensor and including control logic to: store a reference output of the sensor when the wafer handling machine is aligned; store a reference image from the imaging device that indicates a reference height of a component of the wafer handling machine during a portion of a handling cycle; capture a verification image from the imaging device during the portion of another handling cycle; and generate an indication signal when a difference between the reference output and a current output of the sensor during a wafer handling cycle exceeds a first threshold and when a difference between the reference image and the verification image indicates that a difference between the reference height and the height of the wafer handling component in the verification image exceeds a second threshold. 2. The system of claim 1 wherein the system includes a tilt sensor secured to an assembled wafer handling machine. 3. The system of claim 2 wherein the sensor comprises a plurality of sensors including a vibration sensor, a temperature sensor, and a harmonics sensor. 4. The system of claim 1 wherein the controller further includes control logic to command inhibition of automated delivery of semiconductor wafers to the wafer handling machine based on the indication signal. 5. The system of claim 1 wherein the controller further includes a wireless modem for communicating the indication signal. 6. The system of claim 1 wherein the controller further includes a button, and wherein the control logic is further configured to store the reference output when the button is pressed. 7. A wafer handling machine comprising: a load port capable of holding wafers; a robotic arm capable of picking up and moving the wafers; a sensor secured to an outside of at least one of the load port and the robotic arm; an imaging device; a controller including control logic to: store a reference image from the imaging device when the robotic arm is at a reference height during a portion of a handling cycle; capture a verification image from the imaging device during the portion of another handling cycle; and store a reference output of the sensor when the wafer handling machine is aligned; and generate an indication signal when a difference between the reference output and a current output of the sensor during a wafer handling cycle exceeds a first threshold and when a difference between the reference image and the verification image indicates that a difference between the reference height and the height of the robotic arm in the verification image exceeds a second threshold; and an automation control module for controlling movement of the robotic arm, wherein the automation control module is separate from the controller. 8. The wafer handling machine of claim 7 wherein the sensor includes a tilt sensor. 9. The wafer handling machine of claim 7 wherein the sensor comprises a plurality of sensors including a vibration sensor, a temperature sensor, and a harmonics sensor. 10. The wafer handling machine of claim 7 wherein the controller further includes control logic command inhibition of automated delivery of semiconductor wafers to the wafer handling machine based on the indication signal. 11. The wafer handling machine of claim 7 wherein the controller further includes a wireless modem for communicating the indication signal. 12. The wafer handling machine of claim 7 wherein the controller further includes a button, and wherein the control logic is further configured to store the reference output when the button is pressed. 13. A method of monitoring wafer handling, the method comprising: securing an imaging device to the assembled semiconductor wafer handling machine; storing a reference image from the imaging device when a wafer handling component of the wafer handling machine is at a reference height during a portion of a handling cycle; capturing a verification image from the imaging device during the portion of another handling cycle; storing a reference output of a sensor when a wafer handling machine is aligned, wherein the sensor is secured to the wafer handling machine; operating the wafer handling machine for a wafer handling cycle; and generating an indication signal when a difference between the reference output and a current output of the sensor exceeds a first threshold during the wafer handling cycle of the wafer handling machine; and generating the indication signal when a difference between the reference image and the verification image indicates that a difference between the reference height and the height of the wafer handling component in the verification image exceeds a second threshold. 14. The method of claim 13 further comprising securing the sensor to a component of an assembled semiconductor wafer handling machine. 15. The method of claim 14 wherein securing the sensor further includes securing at least one of a tilt sensor, a vibration sensor, a temperature sensor, and a harmonics sensor. 16. The method of claim 13 further comprising inhibiting automated delivery of semiconductor wafers to the wafer handling machine based on the indication signal. 17. The method of claim 13 further comprising securing a tilt sensor to a robotic arm of the wafer handling machine and includes securing a tilt sensor to a load port of the wafer handling machine.
the wafers being placed on a robot blade or gripped by a gripper for conveyance · CPC title
characterised by atmosphere control · CPC title
Position monitoring, e.g. misposition detection or presence detection · CPC title
for positioning, orientation or alignment · CPC title
of substrates stored in a container, a magazine, a carrier, a boat or the like · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.