Superoleophobic surfaces and methods of making same

Patent metadata

Field	Value
Publication number	US-9442375-B2
Application number	US-201314408427-A
Country	US
Kind code	B2
Filing date	Jun 18, 2013
Priority date	Jun 18, 2012
Publication date	Sep 13, 2016
Grant date	Sep 13, 2016

Abstract

Disclosed herein is a substrate having a surface modified to impart multi-scale roughness, thereby providing superhydrophobic and/or superoleophobic properties. The surface comprises a pattern of microscale pillars topped by a plurality of nanoparticles having a re-entrant convex shape. The area fraction of the surface is also selected to provide the desired superoleophobic properties. Also disclosed herein is a process for creating the modified surface comprising photolithography, optionally followed by vapor deposition. The substrates may be formed into useful articles or applied to pre-formed articles.

First claim

The invention claimed is:

1. An article comprising a substrate, the substrate having a surface comprising a pattern of microscale pillars topped with a plurality of nanoparticles, wherein:
the plurality of nanoparticles together create a re-entrant convex morphology atop each pillar, and
the surface has a contact angle for water of greater than 150°.

2. The article of claim 1 , wherein the pattern comprises an array.

3. The article of claim 2 , wherein the surface also has a contact angle for hexadecane of greater than 150°.

4. The article of claim 3 , wherein the nanoparticles comprise a negative photoresist.

5. The article of claim 4 , wherein the surface has a multi-scale morphology.

6. The article of claim 1 , wherein area fraction, f, of the surface is from 0.01 to 0.10.

7. The article of claim 6 , wherein the surface comprises a fluorinated hydrocarbon.

8. The article of claim 7 , wherein the surface comprises a fluorosilane material.

9. The article of claim 8 , wherein the microscale pillars comprise a negative photoresist.

10. The article of claim 9 , wherein both the pillars and the nanoparticles comprise the negative photoresist.

11. The article of claim 10 , where the substrate comprises silicon, glass, metal or a polymer.

12. The article of claim 11 , wherein the substrate is applied to the article.

13. The article of claim 11 , wherein the polymer comprises an elastomer.

14. The article of claim 13 , wherein the elastomer comprises butyl rubber.

Assignees

• Univ Western Ontario
• Lanxess Butyl Pte Ltd
• Arlanxeo Singapore Pte Ltd

Inventors

• Yang Jun
• Li Tingjie
• Paliy Maxim
• Wang Xiaolong
• Suhan Natalie

Classifications

• Y10T428/24405

  Polymer or resin [e.g., natural or synthetic rubber, etc.] · CPC title

• B81B2203/0361

  Tips, pillars · CPC title

• G03F7/004

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

• B81C1/00206 Primary

  Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties · CPC title

• B82Y30/00

  Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title