Semiconductor memory device

US9437656B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9437656-B2
Application numberUS-201414515205-A
CountryUS
Kind codeB2
Filing dateOct 15, 2014
Priority dateMar 24, 2010
Publication dateSep 6, 2016
Grant dateSep 6, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor memory device according to one embodiment of the present invention includes a dielectric film configured to store information depending on presence or absence of a conductive path therein, and a plurality of electrodes provided to contact a first surface of the dielectric film. The conductive path can be formed between two electrodes arbitrarily selected form the plurality of electrodes. The conductive path has a rectifying property of allowing a current to flow more easily in a first direction connecting arbitrary two electrodes than in a second direction opposite to the first direction. The largest possible number of the conductive paths that may be formed is larger than the number of the plurality of electrodes.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor memory device, comprising: a first, a second, a third and a fourth bit line extending in a first direction; a first, a second, a third and a fourth electrode arranged in a second direction intersecting the first direction; a fifth electrode extending in the second direction; a first dielectric film having a first surface and a second surface being opposite to the first surface, the first, second, third and fourth electrodes provided to…

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What does patent US9437656B2 cover?
A semiconductor memory device according to one embodiment of the present invention includes a dielectric film configured to store information depending on presence or absence of a conductive path therein, and a plurality of electrodes provided to contact a first surface of the dielectric film. The conductive path can be formed between two electrodes arbitrarily selected form the plurality of el…
Who is the assignee on this patent?
Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification G11C13/0007. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 06 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).