Quaternary phosphonium salt, epoxy resin composition for encapsulating semiconductor device and including the quaternary phosphonium salt, and semiconductor device encapsulated with the epoxy resin composition

US9428632B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9428632-B2
Application numberUS-201314069564-A
CountryUS
Kind codeB2
Filing dateNov 1, 2013
Priority dateDec 24, 2012
Publication dateAug 30, 2016
Grant dateAug 30, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A quaternary phosphonium salt, an epoxy resin composition including the quaternary phosphonium salt, and a semiconductor device encapsulated with the epoxy resin composition, the quaternary phosphonium salt being represented by Formula 1:

First claim

Opening claim text (preview).

What is claimed is: 1. A salt that is a solid and consisting of a quaternary phosphonium salt represented by Formula 1: wherein: R 1 , R 2 , R 3 , and R 4 are each independently a substituted or unsubstituted C 1 -C 30 hydrocarbon group or a substituted or unsubstituted C 1 -C 30 hydrocarbon group including at least one heteroatom; X is a substituted or unsubstituted C 1 -C 30 hydrocarbon group or a substituted or unsubstituted C 1 -C 30 hydrocarbon group including at least one heteroatom; Y is a substituted or unsubstituted C 1 -C 30 hydrocarbon group or Si substituted with one to three substituted or unsubstituted C 1 -C 30 hydrocarbon groups, the substituted C 1 to C 30 hydrocarbon groups being each independently substituted with a halogen atom, a hydroxyl group, a C 1 -C 10 alkyl group, a C 1 -C 10 haloalkyl group, a C 6 -C 10 aryl group, a C 1 -C 10 alkoxy group, or a combination thereof; n and m are each independently an integer of 1 to 6, provided that when Y is Si, a sum of m and a number of substituents on the Si is a maximum of 4; and 1 is a number greater than 0 and up to 6. 2. The salt as claimed in claim 1 , wherein R 1 , R 2 , R 3 , and R 4 are each independently a substituted or unsubstituted benzene group. 3. The salt as claimed in claim 1 , wherein X is a substituted or unsubstituted benzene group. 4. The salt as claimed in claim 1 , wherein Y is a substituted or unsubstituted benzene group, a substituted or unsubstituted naphthalene group, or Si substituted with one to three substituted or unsubstituted benzene groups. 5. The salt as claimed in claim 1 , wherein n is 2. 6. The salt as claimed in 1 , wherein m is 2 or 3. 7. The salt as claimed in claim 1 , wherein 1 is 2, 3, or 4. 8. A quaternary phosphonium salt represented by one of Formulae 1a to 1k: 9. An epoxy resin composition, comprising: an epoxy resin, a curing agent, a curing accelerator, and an inorganic filler, wherein the curing accelerator includes a quaternary phosphonium salt represented by one of Formulae 1a to 1k: 10. The epoxy resin composition as claimed in claim 9 , wherein the epoxy resin composition includes: about 1% to about 20% by weight of the epoxy resin, about 1% to about 20% by weight of the curing agent, about 0.001% to about 2% by weight of the curing accelerator, and about 70% to about 95% by weight of the inorganic filler. 11. The epoxy resin composition as claimed in claim 9 , wherein the epoxy resin includes at least one of an epoxy resin obtained by epoxidation of condensation products of phenol or alkyl phenols and hydroxybenzaldehyde, a phenol novolac type epoxy resin, a cresol novolac type epoxy resin, a polyfunctional epoxy resin, a naphthol novolac type epoxy resin, a novolac type epoxy resin of bisphenol A/bisphenol F/bisphenol AD, a glycidyl ether of bisphenol A/bisphenol F/bisphenol AD, a bishydroxybiphenyl-based epoxy resin, a dicyclopentadiene-based epoxy resin, a biphenyl type epoxy resin, a polycyclic aromatic-modified epoxy resin, a bisphenol A type epoxy resin, an ortho-cresol novolac type epoxy resin, a phenol aralkyl type epoxy resin, or a naphthalene-based epoxy resin. 12. The epoxy resin composition as claimed in claim 9 , wherein the curing agent includes at least one of a phenol aralkyl type phenolic resin, a xyloc type phenolic resin, a phenol novolac type phenolic resin, a cresol novolac type phenolic resin, a naphthol type phenolic resin, a terpene type phenolic resin, a polyfunctional phenolic resin, a polycyclic aromatic phenolic resin, a dicyclopentadiene-based phenolic resin, a terpene-modified phenolic resin, a dicyclopentadiene-modified phenolic resin, a novolac type phenolic resin synthesized from bisphenol A and resorcinol, a polyhydric phenolic compound, an acid anhydride, a metaphenylenediamine, a diaminodiphenylmethane, or a diaminodiphenylsulfone. 13. The epoxy resin composition as claimed in claim 9 , wherein the epoxy resin and the curing agent are present in amounts such that a ratio of an epoxy equivalent weight of the epoxy resin to a phenolic hydroxyl equivalent weight or an amine equivalent weight of the curing agent is about 0.5:1 to about 2:1.

Assignees

Inventors

Classifications

  • containing a filler · CPC title

  • C08K5/50Primary

    Phosphorus bound to carbon only · CPC title

  • Aromatic phosphonium compounds (P-C aromatic linkage) · CPC title

  • Compositions of epoxy resins; Compositions of derivatives of epoxy resins · CPC title

  • containing phosphorus · CPC title

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Frequently asked questions

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What does patent US9428632B2 cover?
A quaternary phosphonium salt, an epoxy resin composition including the quaternary phosphonium salt, and a semiconductor device encapsulated with the epoxy resin composition, the quaternary phosphonium salt being represented by Formula 1:
Who is the assignee on this patent?
Kim Min Gyum, Han Seung, Cheon Hwan Sung, and 1 more
What technology area does this patent fall under?
Primary CPC classification C08K5/50. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 30 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).