Handle Substrates for Composite Substrates for Semiconductors
US-2016046528-A1 · Feb 18, 2016 · US
US9425083B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9425083-B2 |
| Application number | US-201514853011-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 14, 2015 |
| Priority date | Dec 25, 2013 |
| Publication date | Aug 23, 2016 |
| Grant date | Aug 23, 2016 |
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It is provided a handle substrate of a composite substrate for a semiconductor. The handle substrate is composed of a translucent polycrystalline alumina. A purity of alumina of the translucent polycrystalline alumina is 99.9% or higher, an average of a total forward light transmittance of the translucent polycrystalline alumina is 60% or higher in a wavelength range of 200 to 400 nm, and an average of a linear light transmittance of the translucent polycrystalline alumina is 15% or lower in a wavelength range of 200 to 400 nm.
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The invention claimed is: 1. A handle substrate of a composite substrate for a semiconductor, said handle substrate comprising a translucent polycrystalline alumina: wherein a purity of alumina of said translucent polycrystalline alumina is 99.9% or higher; wherein an average of a total forward light transmittance of said translucent polycrystalline alumina is 60% or higher in a wavelength range of 200 to 400 nm, and wherein an average of a linear light transmittance of said translucent polycrystalline alumina is 15% or lower in a wavelength range of 200 to 400 nm. 2. A composite substrate for a semiconductor, said composite substrate comprising: said handle substrate of claim 1 ; and a donor substrate bonded to a bonding surface of said handle substrate. 3. The composite substrate of claim 2 , wherein said donor substrate comprises monocrystalline silicon. 4. A semiconductor circuit board, comprising: said composite substrate for a semiconductor of claim 2 ; and a circuit provided on said donor substrate. 5. A method of manufacturing a semiconductor circuit board, said semiconductor circuit board comprising a handle substrate, a donor substrate bonded to a bonding surface of said handle substrate and a circuit provided on said donor substrate, the method comprising the steps of: preparing a component, said component comprising a base substrate comprising a translucent polycrystalline alumina and having a bonding surface and an opposed surface, a donor substrate bonded to a bonding surface of said base substrate, and a circuit provided on said donor substrate, wherein a purity of alumina of said translucent polycrystalline alumina is 99.9% or higher, an average of a total forward light transmittance of said translucent polycrystalline alumina is 60% or higher in a wavelength range of 200 to 400 nm, and an average of a linear light transmittance of said translucent polycrystalline alumina is 15% or lower in a wavelength range of 200 to 400 nm; forming said handle substrate by processing said base substrate from a side of said opposed surface to thereby decrease a thickness of said base substrate; and irradiating ultraviolet rays in a wavelength range of 200 to 400 nm to a ultraviolet curable resin from a side of said handle substrate, thereby curing said ultraviolet curable resin, while said ultraviolet curable resin is placed to intervene between said donor substrate and a supporting body. 6. The method of claim 5 , further comprising the step of: removing said supporting body from said semiconductor circuit board, after curing said ultraviolet curable resin. 7. The method of claim 5 , wherein said donor substrate comprises monocrystalline silicon.
with parts of the auxiliary support remaining in the finished device · CPC title
used during dicing or grinding · CPC title
Details of chemical or physical process used for separating the auxiliary support from a device or a wafer · CPC title
Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement · CPC title
using temporarily an auxiliary support · CPC title
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