Method for manufacturing semiconductor device

US9419142B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9419142-B2
Application numberUS-201213431073-A
CountryUS
Kind codeB2
Filing dateMar 27, 2012
Priority dateMar 3, 2006
Publication dateAug 16, 2016
Grant dateAug 16, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device comprising: a first flexible substrate; an organic compound layer in which inorganic compound particles are dispersed over and in contact with the first flexible substrate; an insulating layer over and in direct contact with the organic compound layer; an electrophoresis element over and in direct contact with the insulating layer; and a second flexible substrate over and in direct contact with the electrophoresis element, wherein the inorganic compound particles comprise one of silicon oxide, silicon nitride, aluminum oxide, tantalum oxide, and barium fluoride magnesium, wherein the insulating layer is a single layer selected from silicon nitride, silicon oxide, and aluminum nitride, and wherein the electrophoresis element includes a first conductive layer, a second conductive layer in direct contact with the second flexible substrate, and a microcapsule. 2. The semiconductor device according to claim 1 , wherein the first conductive layer is electrically connected to the microcapsule, and wherein the microcapsule is electrically connected to the second conductive layer. 3. The semiconductor device according to claim 1 , wherein the microcapsule is fixed between the first conductive layer and the second conductive layer with a binder. 4. The semiconductor device according to claim 1 , wherein the microcapsule includes a black particle and a white particle. 5. A semiconductor device comprising: a first flexible substrate; an organic compound layer in which particles having light shielding properties are dispersed over and in contact with the first flexible substrate; an insulating layer over and in direct contact with the organic compound layer; an electrophoresis element over and in direct contact with the insulating layer; and a second flexible substrate over and in direct contact with the electrophoresis element, wherein the particles having light shielding properties absorb light in the wavelength range from 280 to 780 nm, wherein the insulating layer is a single layer selected from silicon nitride, silicon oxide, and aluminum nitride, and wherein the electrophoresis element includes a first conductive layer, a second conductive layer in direct contact with the second flexible substrate, and a microcapsule. 6. The semiconductor device according to claim 5 , wherein the first conductive layer is electrically connected to the microcapsule, and wherein the microcapsule is electrically connected to the second conductive layer. 7. The semiconductor device according to claim 5 , wherein the microcapsule is fixed between the first conductive layer and the second conductive layer with a binder. 8. The semiconductor device according to claim 5 , wherein the microcapsule includes a black particle and a white particle. 9. A semiconductor device comprising: a first flexible substrate; an organic compound layer in which inorganic compound particles are dispersed over and in contact with the first flexible substrate; an insulating layer over and in direct contact with the organic compound layer; a switching element over and in direct contact with the insulating layer; an electrophoresis element over the switching element; and a second flexible substrate over and in direct contact with the electrophoresis element, wherein the inorganic compound particles comprise one of silicon oxide, silicon nitride, aluminum oxide, tantalum oxide, and barium fluoride magnesium, wherein the insulating layer is a single layer selected from silicon nitride, silicon oxide, and aluminum nitride, wherein the electrophoresis element includes a first conductive layer, a second conductive layer in direct contact with the second flexible substrate, and a microcapsule, and wherein the first conductive layer is electrically connected to the switching element. 10. The semiconductor device according to claim 9 , wherein the first conductive layer is electrically connected to the microcapsule, and wherein the microcapsule is electrically connected to the second conductive layer. 11. The semiconductor device according to claim 9 , wherein the microcapsule is fixed between the first conductive layer and the second conductive layer with a binder. 12. The semiconductor device according to claim 9 , wherein the microcapsule includes a black particle and a white particle. 13. A semiconductor device comprising: a first flexible substrate; an organic compound layer in which particles having light shielding properties are dispersed over and in contact with the first flexible substrate; an insulating layer over and in direct contact with the organic compound layer; a switching element over and in direct contact with the insulating layer; an electrophoresis element over the switching element; and a second flexible substrate over and in direct contact with the electrophoresis element, wherein the particles having light shielding properties absorb light in the wavelength range from 280 to 780 nm, wherein the insulating layer is a single layer selected from silicon nitride, silicon oxide, and aluminum nitride, wherein the electrophoresis element includes a first conductive layer, a second conductive layer in direct contact with the second flexible substrate, and a microcapsule, and wherein the first conductive layer is electrically connected to the switching element. 14. The semiconductor device according to claim 13 , wherein the first conductive layer is electrically connected to the microcapsule, and wherein the microcapsule is electrically connected to the second conductive layer. 15. The semiconductor device according to claim 13 , wherein the microcapsule is fixed between the first conductive layer and the second conductive layer with a binder. 16. The semiconductor device according to claim 13 , wherein the microcapsule includes a black particle and a white particle.

Assignees

Inventors

Classifications

  • Organic transistors · CPC title

  • characterised by materials, geometry or structure of the substrates · CPC title

  • wherein the TFTs are in active matrices · CPC title

  • characterised by multiple TFTs · CPC title

  • characterised by the insulating substrates · CPC title

Patent family

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Frequently asked questions

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What does patent US9419142B2 cover?
A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocat…
Who is the assignee on this patent?
Morisue Masafumi, Jinbo Yasuhiro, Fujii Gen, and 2 more
What technology area does this patent fall under?
Primary CPC classification H10D86/0214. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 16 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).