Sapphire property modification through ion implantation

Patent metadata

Field	Value
Publication number	US-9416442-B2
Application number	US-201313783264-A
Country	US
Kind code	B2
Filing date	Mar 2, 2013
Priority date	Mar 2, 2013
Publication date	Aug 16, 2016
Grant date	Aug 16, 2016

Abstract

Systems and methods for strengthening a sapphire part are described herein. One method may take the form of orienting a first surface of a sapphire member relative to an ion implantation device, selecting an ion implantation concentration and directing ions at the first surface of the sapphire member. The ions are embedded under the first surface to create compressive stress in the sapphire surface.

First claim

We claim:

1. A method comprising:
orienting a surface of a sapphire sheet relative to an ion implantation device;
directing a first group of ions at a perimeter region of the surface of the sapphire sheet, the first group of ions embedding under the surface at a first concentration to create a compressive stress in the sapphire surface;
directing a second group of ions at a window region of the surface of the sapphire sheet at least partially surrounded by the perimeter region, the second group of ions embedding under the surface at a second concentration to create a compressive stress in the sapphire surface; wherein
a concentration gradient is formed at a transition region between the perimeter and window regions.

2. The method of claim 1 , wherein the first group of ions are directed at the surface to achieve an ion concentration of between 10 13 and 10 19 ions/cm 2 .

3. The method of claim 1 , wherein the perimeter region is formed around an entire perimeter of the sapphire sheet.

4. The method of claim 1 , wherein:
the surface is a first surface; and
the method further comprises:
reorienting the sapphire sheet;
and
directing a third group of ions at a second surface of the sapphire sheet, the ions embedding under the second surface to create a compressive stress in the second surface.

5. The method of claim 4 , wherein the third group of ions embed under the second surface at a third concentration different from the first and second concentrations.

6. The method of claim 4 , wherein the first, second, and third groups of are each selected to comprise one or more of nitrogen ions, argon ions, titanium ions, or iron ions.

7. The method of claim 6 , wherein the first group of ions comprise +1 ions.

8. The method of claim 6 , wherein the first group of ions comprise +2 ions.

9. The method of claim 1 , wherein the first group of ions penetrate to and are embedded in a primary lattice layer of the sapphire sheet.

10. The method of claim 1 , wherein the first group of ions penetrate to and are embedded in a second lattice layer of the sapphire sheet.

11. The method of claim 1 further comprising masking a portion of the surface to preclude ion implantation in the masked portion of the sapphire surface.

12. A method comprising:
selecting a first ion implantation concentration for a first portion of a surface of a sapphire sheet;
directing ions at the first portion of the surface of the sapphire sheet at the first ion implantation concentration, the ions embedding under the first portion to create a compressive stress in the first portion;
selecting a second ion implantation concentration for a second portion of the surface of the sapphire sheet, the second ion implantation concentration having a distinct energy or emitted ion concentration from the first ion implantation; and
directing ions at the second portion of the surface of the sapphire sheet at the second ion implantation concentration, the ions embedding under the second portion to create a compressive stress in the second portion; wherein
the second portion of the surface of the sapphire sheet at least partially surrounds the first portion of the surface of the sapphire sheet and a concentration gradient is formed between the first portion and the second portion.

13. The method of claim 12 , wherein directing the ions at the first portion of the sapphire sheet at the first ion implantation concentration further comprises embedding the ions under the first portion at a first depth.

14. The method of claim 13 , wherein directing the ions at the second portion of the sapphire sheet at the second ion implantation concentration further comprises embedding the ions under the second portion at a second depth.

15. The method of claim 14 , wherein the second depth is different from the first depth.

16. The method of claim 12 , wherein the type of ions embedded under the first portion are distinct from the ions embedded under the second portion.

17. The method of claim 12 , wherein the first portion comprises a top surface of the sapphire sheet.

18. The method of claim 17 , wherein the second portion comprises at least one edge surface.

Assignees

• Apple Inc

Inventors

• Memering Dale N
• Prest Christopher D
• Weber Douglas

Classifications

• C30B29/20

  Aluminium oxides · CPC title

• C30B31/22

  by ion-implantation · CPC title

• H01J2237/202

  Movement · CPC title

• H01J2237/20207

  Tilt · CPC title

• H01J2237/31701

  Ion implantation · CPC title