Radiation source, lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9414477-B2
Application number	US-54054809-A
Country	US
Kind code	B2
Filing date	Aug 13, 2009
Priority date	Aug 14, 2008
Publication date	Aug 9, 2016
Grant date	Aug 9, 2016

Abstract

A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.

First claim

What is claimed is:

1. A radiation source, comprising:
a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, the radiation source configured to focus at least part of the radiation beam onto a focus spot; and
a beam monitor configured to monitor a quality of the radiation beam at the focus spot, the beam monitor comprising an analyzer module configured to analyze the radiation beam at a beam analyzing location separate from the beam generator.

2. The radiation source of claim 1 , wherein the analyzer module comprises a wavefront sensor configured to determine wavefront deviations in the radiation beam.

3. The radiation source according to claim 2 , wherein the wavefront sensor is a Shack-Hartmann interferometer.

4. The radiation source according to claim 1 , wherein the quality of the radiation beam relates to one or more of a size, shape, intensity and location of the beam at the focus spot.

5. The radiation source according to claim 1 , wherein the radiation source comprises a fuel supplier configured to supply a plasma fuel to a fuel ignition location, and wherein the radiation source is configured to utilize the radiation beam to ignite fuel, present at the ignition location, to generate radiation emitting plasma.

6. The radiation source according to claim 1 , wherein the radiation source is configured to produce extreme ultra violet (EUV) radiation by utilizing the radiation beam generated by the beam generator.

7. The radiation source according to claim 1 , further comprising an optical system configured to focus at least part of the radiation beam onto the focus spot, wherein at least part of the optical system is part of the beam monitor.

8. The radiation source according to claim 7 , wherein the optical system is configured to focus at least part of the radiation beam onto a first focus spot to produce a radiation output, and wherein the optical system is also configured to focus at least part of the radiation beam onto a second focus spot, separate from the first focus spot, the second focus spot being associated with the beam monitor.

9. The radiation source according to claim 1 , further comprising a beam steering device configured to direct at least part of the radiation beam towards a plasma fuel ignition location, wherein the beam steering device is also configured to direct at least part of the radiation beam towards the beam analyzing location to be analyzed.

10. The radiation source according to claim 9 , wherein the beam steering device is a beam splitter configured to split the incoming beam at least into a first beam part and a second beam part.

11. The radiation source according to claim 1 , wherein the beam monitor further comprises a beam divider configured to divide at least part of the radiation beam into a plurality of parts, and wherein the analyzer module is configured to determine a position shift of the parts due to wave front distortion of the beam, with respect to positions of the parts relating to an undistorted wavefront.

12. The radiation source according to claim 1 , wherein the radiation source is configured to produce a radiation emitting plasma by utilizing the radiation beam.

13. The radiation source according to claim 1 , wherein the analyzer module includes a radiation absorber and a thermal conditioning system to remove heat from the radiation absorber.

14. A lithographic apparatus, comprising:
a radiation source, comprising
a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, the radiation source configured to focus at least part of the radiation beam onto a focus spot, and
a beam monitor configured to monitor a quality of the radiation beam at the focus spot, the beam monitor comprising an analyzer module configured to analyze the radiation beam at a beam analyzing location separate from the beam generator;

a support configured to support a patterning device, the patterning device being configured to pattern the radiation output of the radiation source into a patterned beam of radiation; and
a projection system configured to project the patterned beam of radiation onto a substrate.

15. A device manufacturing method comprising:
producing a first type of radiation with a radiation source comprising
a beam generator configured to generate a beam of second type of radiation to be used to produce the first type of radiation, the radiation source configured to focus at least part of the beam of second type of radiation onto a focus spot, and
a beam monitor configured to monitor a quality of the beam of second type of radiation at the focus spot, the beam monitor comprising an analyzer module configured to analyze the radiation beam at a beam analyzing location separate from the beam generator;

patterning the first type of radiation produced by the radiation source; and
projecting a patterned beam of radiation onto a substrate.

16. A device manufacturing method comprising:
generating a first type of radiation utilizing a beam of a second type of radiation generated by a beam generator;
monitoring a quality of the beam of the second type of radiation at a focus spot by analyzing the second type of radiation at a beam analyzing location separate from a location of the beam generator; and
projecting a patterned beam of the first type of radiation onto a substrate.

Assignees

• Loopstra Erik Roelof
• Van Schoot Jan Bernard Plechelmus
• Swinkels Gerardus Hubertus Petrus Maria
• Asml Netherlands Bv

Inventors

• Loopstra Erik Roelof
• Van Schoot Jan Bernard Plechelmus
• Swinkels Gerardus Hubertus Petrus Maria

Classifications

• H05G2/0086 Primary

  Optical arrangements for conveying the laser beam to the plasma generation location · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70033

  by plasma extreme ultraviolet [EUV] sources · CPC title

• H05G2/001 Primary

  Production of X-ray radiation generated from plasma · CPC title