Methods of forming dielectric layers and methods of manufacturing semiconductor devices using the same

Patent metadata

Field	Value
Publication number	US-9412583-B2
Application number	US-201213400952-A
Country	US
Kind code	B2
Filing date	Feb 21, 2012
Priority date	Mar 4, 2011
Publication date	Aug 9, 2016
Grant date	Aug 9, 2016

Abstract

To form a dielectric layer, an organometallic precursor is adsorbed on a substrate loaded into a process chamber. The organometallic precursor includes a central metal and ligands bound to the central metal. An inactive oxidant is provided onto the substrate. The inactive oxidant is reactive with the organometallic precursor. An active oxidant is also provided onto the substrate. The active oxidant has a higher reactivity than that of the inactive oxidant.

First claim

What is claimed is:

1. A method of forming a dielectric layer, comprising:
adsorbing an organometallic precursor on a substrate loaded into a process chamber, the organometallic precursor including a central metal and ligands bound to the central metal;
providing an inactive oxidant onto the substrate to form a preliminary dielectric layer, the inactive oxidant being reactive with the organometallic precursor; and
providing an active oxidant onto the substrate after providing the inactive oxidant such that the preliminary dielectric layer is transformed into a dielectric layer, the active oxidant having a higher reactivity than a reactivity of the inactive oxidant.

2. The method of claim 1 , wherein the organometallic precursor is represented by a chemical formula:
M(NL1L2)nL3m  chemical formula

wherein M represents a central metal and N represents a nitrogen atom,
each of L1 and L2 independently represents a C1 to C5 alkyl group bound to the nitrogen atom,
NL1L2 represents an amido group as a first ligand bound to the central metal M,
L3 represents a second ligand, and
n and m are integers and 2 ≦(n+m)≦8,
wherein the second ligand L3 is one of NL1L2, a C1 to C5 alkyl group, an aromatic compound having 4 or more carbon atoms and optionally including a substituent, or a heterocyclic compound having 4 or more carbon atoms and optionally including the substituent, wherein the substituent includes a methyl group, an ethyl group or tert-butyl group.

3. The method of claim 1 , the central metal includes at least one selected from the group consisting of lithium (Li), beryllium (Be), boron (B), sodium (Na), magnesium (Mg), aluminum (Al), potassium (K), calcium (Ca), scandium (Sc), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), gallium (Ga), germanium (Ge), rubidium (Rb), strontium (Sr), yttrium (Y), zirconium (Zr), niobium (Nb), molybdenum (Mo), technetium (Tc), ruthenium (Ru), rhodium (Rh), palladium (Pd), silver (Ag), cadmium (Cd), indium (In), tin (Sn), antimony (Sb), tellurium (Te), cesium (Cs), barium (Ba), lanthanum (La), cerium (Ce), praseodymium (Pr), neodymium (Nd), promethium (Pm), samarium (Sm), europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb), lutetium (Lu), hafnium (Hf), tantalum (Ta), tungsten (W), rhenium (Re), osmium (Os), iridium (Ir), platinum (Pt), gold (Ag), mercury (Hg), lead (Pb), bismuth (Bi), polonium (Po), raverium (Rr), radium (Ra), actinium (Ac) and silicon (Si).

4. The method of claim 1 , wherein the organometallic precursor includes at least one selected from the group consisting of tetrakis-ethylmethylamido-zirconium (TEMAZ), tetrakis-ethylmethylamido-hafnium, tetrakis-diethylamido-zirconium (TDEAZ), tetrakis-diethylamido-hafnium, tetrakis-dimethylamido-zirconium (TDMAZ), tetrakis-dimethylamido-hafnium, tetrakis-ethyldimethylamido-zirconium, tetrakis-ethyldimethylamido-hafnium, tetrakis-diethylmethylamido-zirconium, tetrakis-diethylmethylamido-hafnium, tetrakis-triethylamido-zirconium, tetrakis-triethylamido-hafnium, bis-diisopropylamido-bis-dimethylamido-hafnium, bis-diisopropylamido-bis-dimethylamido-zirconium, bis-di-t-butylamido-bis-dimethylamido-hafnium, bis-di-t-butylamido-bis-dimethylamido-zirconium, bis-ethylmethylamido-bis-diisopropylamido-hafnium, bis-ethylmethylamido-bis-diisopropylamido-zirconium, bis-diethylamido-bis-diisopropylamido-hafnium, bis-diethylamido-bis-diisopropylamido-zirconium, tris-diisopropylamido-dimethylamido-hafnium, tris-diisopropylamido-dimethylamido-zirconium, tris-diethylamido-diisopropylamido-hafnium and tris-diethylamido-diisopropylamido-zirconium.

5. The method of claim 1 , wherein the inactive oxidant includes at least one selected from the group consisting of water (H2O), oxygen (O2), nitrous oxide (N2O), alcohol and a metal alkoxide.

6. The method of claim 1 , wherein the active oxidant includes at least one selected from the group of consisting of ozone (O3), O2 plasma, remote plasma O2, N2O plasma and H2O plasma.

7. The method of claim 1 , wherein the inactive oxidant and the active oxidant include H2O and O3, respectively,
the ligands are substituted with a hydroxyl group by the inactive oxidant, and
the hydroxyl group is substituted with oxygen by the active oxidant.

8. The method of claim 1 , further comprising purging and pumping out the process chamber after adsorbing the organometallic precursor on the substrate, after providing the inactive oxidant and after providing the active oxidant.

9. The method of claim 1 , further comprising performing a plasma treatment or a heat treatment after providing the active oxidant.

10. The method of claim 1 , wherein the substrate includes a conductive structure.

11. The method of claim 10 , wherein the conductive structure includes at least one selected from the group consisting of titanium nitride, tantalum nitride and tungsten nitride.

12. The method of claim 1 , wherein the organometallic precursor is adsorbed on the substrate using oxygen atoms as adsorbing sites.

13. The method of claim 1 , wherein the adsorbing an organometallic precursor, providing an inactive oxidant, and providing an active oxidant define one process cycle, and
wherein the method comprises repeatedly performing a plurality of process cycles.

14. The method of claim 1 , wherein the organometallic precursor is from a source gas introduced into the process chamber, and
wherein the inactive oxidant and the active oxidant are provided in succession without introduction of another source gas there between into the process chamber.

15. The method of claim 14 , further comprising purging the process chamber between providing the inactive oxidant and the active oxidant.

Assignees

• Kang Sang-Yeol
• Chung Suk-Jin
• Kim Youn-Soo
• Choi Jae-Hyoung
• Lim Jae-Soon
• Park Min-Young
• Samsung Electronics Co Ltd

Inventors

• Kang Sang-Yeol
• Chung Suk-Jin
• Kim Youn-Soo
• Choi Jae-Hyoung
• Lim Jae-Soon
• Park Min-Young

Classifications

• H10P14/69395

  the material containing zirconium, e.g. ZrO2 · CPC title

• H10P14/69392

  the material containing hafnium, e.g. HfO2 · CPC title

• H10P14/69391

  the material containing aluminium, e.g. Al2O3 · CPC title

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10P14/6334

  using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition (deposition by physical ablation of a target H10P14/6329) · CPC title