Method and composition for removing radioactive cesium

US9412479B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9412479-B2
Application numberUS-201514795986-A
CountryUS
Kind codeB2
Filing dateJul 10, 2015
Priority dateFeb 19, 2013
Publication dateAug 9, 2016
Grant dateAug 9, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention intends to provide a method for removing radioactive cesium, or radioactive iodine and radioactive cesium that is simple and low-cost, further does not require an energy source such as electricity, moreover can take in and stably immobilize the removed radioactive substances within a solid, and can reduce the volume of radioactive waste as necessary, and to provide a hydrophilic resin composition using for the method for removing radioactive cesium, or radioactive iodine and radioactive cesium, and the object of the present invention is achieved by using a hydrophilic resin composition containing: at least one hydrophilic resin selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having at least a hydrophilic segment; and a clay mineral dispersed therein in a ratio of at least 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for removing radioactive cesium applying removal processing to radioactive cesium in a radioactive waste liquid and/or a radioactive solid matter using a hydrophilic resin composition comprising a hydrophilic resin and a clay mineral, wherein the hydrophilic resin composition comprises at least one hydrophilic resin selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having a hydrophilic segment; and the hydrophilic resin composition comprises the clay mineral dispersed therein in a ratio of at least 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin. 2. A method for removing radioactive cesium applying removal processing to radioactive cesium present in a radioactive waste liquid and/or a radioactive solid matter using a hydrophilic resin composition comprising a hydrophilic resin and a clay mineral, wherein the hydrophilic resin composition comprises at least one hydrophilic resin selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having a hydrophilic segment and further each having, in the main chain and/or a side chain in the structure thereof, a polysiloxane segment; and the hydrophilic resin composition comprises the clay mineral dispersed therein in a ratio of at least 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin. 3. The method for removing radioactive cesium according to claim 2 , wherein the hydrophilic resin is a resin formed from, as a part of a raw material, a compound having at least one active hydrogen-containing group and a polysiloxane segment in the same molecule. 4. The method for removing radioactive cesium according to claim 1 , wherein the hydrophilic segment is a polyethylene oxide segment. 5. The method for removing radioactive cesium according to claim 1 , wherein the clay mineral is at least one selected from the group consisting of pyrophylite, Kaolinite, mica, smectite (montmorillonite), and vermiculite each having a layered structure. 6. A hydrophilic resin composition for removing radioactive cesium having a function capable of immobilizing radioactive cesium in liquid and/or a solid matter, wherein the hydrophilic resin composition comprises a hydrophilic resin and a clay mineral; the hydrophilic resin is a hydrophilic resin having a hydrophilic segment, the resin being insoluble to water and hot water; and the clay mineral is dispersed in the hydrophilic resin composition in a ratio of at least 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin. 7. A hydrophilic resin composition for removing radioactive cesium having a function of removing radioactive cesium in liquid and/or a solid matter, wherein the hydrophilic resin composition comprises a hydrophilic resin and a clay mineral; the hydrophilic resin is at least one selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having a hydrophilic segment and each obtained by reacting an organic polyisocyanate with a high molecular weight hydrophilic polyol and/or polyamine being a hydrophilic component; and the clay mineral is dispersed in the hydrophilic resin composition in a ratio of at least 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin. 8. A hydrophilic resin composition for removing radioactive cesium exhibiting a function capable of immobilizing radioactive cesium in liquid and/or a solid matter, wherein the hydrophilic resin composition comprises a hydrophilic resin and a clay mineral; the hydrophilic resin is a resin having a hydrophilic segment and a polysiloxane segment and obtained by reacting, as a part of a raw material, a compound having at least one active hydrogen-containing group and a polysiloxane segment in the same molecule, the resin being insoluble to water and hot water; and the clay mineral is dispersed in the hydrophilic resin composition in a ratio of at least 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin. 9. A hydrophilic resin composition for removing radioactive cesium exhibiting a function capable of immobilizing radioactive cesium in liquid and/or a solid matter, wherein the hydrophilic resin composition comprises a hydrophilic resin and a clay mineral; the hydrophilic resin is at least one selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having a hydrophilic segment, further each having, in the main chain and/or a side chain in the structure thereof, a polysiloxane segment, and each obtained by reacting an organic polyisocyanate, a high molecular weight hydrophilic polyol and/or polyamine being a hydrophilic component, and a compound having at least one active hydrogen-containing group and a polysiloxane segment in the same molecule; and the clay mineral is dispersed in the hydrophilic resin composition in a ratio of at least 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin. 10. The hydrophilic resin composition for removing radioactive cesium according to claim 6 , wherein the hydrophilic segment is a polyethylene oxide segment. 11. The hydrophilic resin composition for removing radioactive cesium according to claim 6 , wherein the clay mineral is at least one selected from the group consisting of pyrophylite, Kaolinite, mica, smectite (montmorillonite), and vermiculite each having a layered structure. 12. A method for removing radioactive iodine and radioactive cesium applying removal processing to both of radioactive iodine and radioactive cesium in a radioactive waste liquid and/or a radioactive solid matter using a hydrophilic resin composition comprising a hydrophilic resin and a clay mineral, wherein the hydrophilic resin composition comprises at least one hydrophilic resin selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having a hydrophilic segment and further each having, in the main chain and/or a side chain in the structure thereof, a tertiary amino group; and the hydrophilic resin composition comprises the clay mineral dispersed therein in a ratio of 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin. 13. The method for removing radioactive iodine and radioactive cesium according to claim 12 , wherein the hydrophilic resin is a resin formed from, as a part of a raw material, a polyol having at least one tertiary amino group or a polyamine having at least one tertiary amino group. 14. A method for removing radioactive iodine and radioactive cesium capable of applying removal processing to both of radioactive iodine and radioactive cesium present in a radioactive waste liquid and/or a radioactive solid matter using a hydrophilic resin composition comprising a hydrophilic resin and a clay mineral, wherein the hydrophilic resin composition comprises at least one hydrophilic resin selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having a hydrophilic segment and further each having, in the main chain and/or a side chain in the structure thereof, a tertiary amino group and a polysiloxane segment; and the hydrophilic resin composition comprises the clay mineral dispersed therein in a ratio of 1 to 180 mass parts r

Assignees

Inventors

Classifications

  • containing primary and/or secondary amino groups · CPC title

  • containing two hydroxy groups · CPC title

  • G21F9/162Primary

    in an inorganic matrix, e.g. clays, zeolites · CPC title

  • Processing (separating different isotopes of the same chemical element B01D59/00) · CPC title

  • Polyurethanes · CPC title

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What does patent US9412479B2 cover?
The present invention intends to provide a method for removing radioactive cesium, or radioactive iodine and radioactive cesium that is simple and low-cost, further does not require an energy source such as electricity, moreover can take in and stably immobilize the removed radioactive substances within a solid, and can reduce the volume of radioactive waste as necessary, and to provide a hydro…
Who is the assignee on this patent?
Dainichiseika Color Chem, Ukima Colour & Chem Mfg
What technology area does this patent fall under?
Primary CPC classification G21F9/162. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 09 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).