Method for forming anodized layer, method for producing mold, method for producing antireflective film, and mold and antireflective film

US9403293B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9403293-B2
Application numberUS-201013392902-A
CountryUS
Kind codeB2
Filing dateAug 31, 2010
Priority dateSep 4, 2009
Publication dateAug 2, 2016
Grant dateAug 2, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An anodized layer formation method of an embodiment of the present invention includes the steps of: (a) providing an aluminum base which has a surface that is made of aluminum; (b) anodizing the surface to form a barrier-type alumina layer; and (c) after step (b), further anodizing the surface to form a porous alumina layer which has a plurality of minute recessed portions. According to an embodiment of the present invention, a method is provided that enables formation of a porous alumina layer which has an interpore distance of a desired magnitude with the use of an aluminum base which has a surface that is made of aluminum, irrespective of the surface form.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of forming an anodized layer, comprising the steps of: (a) providing an aluminum base which has a surface that is made of aluminum; (b) anodizing the surface to form a barrier-type alumina layer; and (c) after step (b), further anodizing the surface to form a porous alumina layer which has a plurality of minute recessed portions, wherein the anodization in step (c) is performed with application of a pulse voltage, the pulse voltage having a pulse width of not more than 200 msec and a pulse interval of not less than 800 msec, wherein step (b) is performed in a first electrolytic solution, and step (c) is performed in a second electrolytic solution which is different from the first electrolytic solution, and wherein the different is that the first electrolytic solution is an aqueous solution containing at least one of acids or salts selected from a group consisting of ammonium tartrate, potassium sodium tartrate, boric acid, ammonium borate, ammonium oxalate, ammonium citrate, maleic acid, malonic acid, phthalic acid, and citric acid and the second electrolytic solution is an aqueous solution containing an acid selected from a group consisting of sulfuric acid, oxalic acid, tartaric acid, phosphoric acid, chromic acid and malic acid. 2. The method of claim 1 , wherein pH of the first electrolytic solution is more than 3.0 and less than 8.0. 3. The method of claim 1 , further comprising: (d) after step (c), bringing the porous alumina layer into contact with an etching solution, thereby enlarging the plurality of minute recessed portions of the porous alumina layer; and (e) after step (d), further performing an anodization to grow the plurality of minute recessed portions. 4. A method of fabricating a mold which has an inverted moth-eye structure in its surface using the anodized layer formation method of claim 3 , comprising the step of forming a porous alumina layer which has a plurality of minute recessed portions whose two-dimensional size viewed in a direction normal to the surface is not less than 50 nm.

Assignees

Inventors

Classifications

  • Porous moulds (adapted for vacuum forming B29C51/365) · CPC title

  • G02B1/118Primary

    having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures · CPC title

  • for forming AAO templates · CPC title

  • Moulding surfaces provided with means for marking or patterning (for injection moulding B29C45/372) · CPC title

  • Aluminium · CPC title

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What does patent US9403293B2 cover?
An anodized layer formation method of an embodiment of the present invention includes the steps of: (a) providing an aluminum base which has a surface that is made of aluminum; (b) anodizing the surface to form a barrier-type alumina layer; and (c) after step (b), further anodizing the surface to form a porous alumina layer which has a plurality of minute recessed portions. According to an embo…
Who is the assignee on this patent?
Isurugi Akinobu, Minoura Kiyoshi, Imaoku Takao, and 1 more
What technology area does this patent fall under?
Primary CPC classification B29C33/3814. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).