Mold, method for manufacturing a mold, and antireflective film

Patent metadata

Field	Value
Publication number	US-9366785-B2
Application number	US-201013504180-A
Country	US
Kind code	B2
Filing date	Oct 27, 2010
Priority date	Oct 28, 2009
Publication date	Jun 14, 2016
Grant date	Jun 14, 2016

Abstract

A moth-eye mold fabrication method includes: (a) providing an aluminum film deposited on a base, the aluminum film having a thickness of not less than 0.5 μm and not more than 5 μm, a surface of the aluminum film having a plurality of crystal grains whose average crystal grain diameter is not less than 200 nm and not more than 5 μm; (b) after step (a), anodizing the surface of the aluminum film to form a porous alumina layer which has a plurality of minute recessed portions; and (c) after step (b), bringing the porous alumina layer into contact with an etching solution, thereby enlarging the plurality of minute recessed portions of the porous alumina layer. A method of readily fabricating a mold is produced that is for manufacture of an antireflection film in which a moth-eye structure is superposed over an antiglare structure.

First claim

The invention claimed is:

1. A method of fabricating a mold that has an inverted moth-eye structure in its surface, the inverted moth-eye structure having a plurality of recessed portions whose two-dimensional size viewed in a direction normal to the surface is not less than 50 nm and less than 500 nm, the method comprising the steps of:
(a) providing an aluminum film deposited on a base, the aluminum film having a thickness of not less than 0.5 μm and not more than 5 μm, a surface of the aluminum film having a plurality of crystal grains whose crystal grain diameter distribution has two local maximums, the larger one of the local maximums being not less than 200 nm;
(b) after step (a), anodizing the surface of the aluminum film to form a porous alumina layer which has a plurality of minute recessed portions; and
(c) after step (b), bringing the porous alumina layer into contact with an etching solution, thereby enlarging the plurality of minute recessed portions of the porous alumina layer.

2. The method of claim 1 , wherein
an average crystal grain diameter of the plurality of crystal grains is not less than 200 nm and not more than 5 μm, and
the larger local maximum of the crystal grain diameter distribution of the plurality of crystal grains is not less than 400 nm.

3. The method of claim 1 , wherein 5% or more of the plurality of crystal grains have a grain diameter of greater than R1−{(R1−R2)/2}, where R1 is the larger local maximum of the crystal grain diameter distribution of the plurality of crystal grains, and R2 is the smaller local maximum.

4. The method of claim 1 , wherein an n-point average roughness (Rz) of the surface of the aluminum film is not less than 100 nm.

5. The method of claim 1 , wherein the crystal grain diameter distribution of the plurality of crystal grains is wider than a range of ±50 nm from an average crystal grain diameter.

6. The method of claim 1 , further comprising the step (d) of further anodizing the surface of the aluminum film to grow the plurality of minute recessed portions,
wherein, after step (c), step (d) and step (c) are further performed.

Assignees

• Minoura Kiyoshi
• Isurugi Akinobu
• Sharp Kk

Inventors

• Minoura Kiyoshi
• Isurugi Akinobu

Classifications

• C25D11/12

  Anodising more than once, e.g. in different baths · CPC title

• G02B1/118 Primary

  having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures · CPC title

• B29C33/56

  Coatings {, e.g. enameled or galvanised}; Releasing, lubricating or separating agents {(in-mould coating B29C37/0028; using or applying separating agents B29C37/0067)} · CPC title

• C25D11/045

  for forming AAO templates · CPC title

• C25D11/24

  Chemical after-treatment · CPC title